R. Etemadi

发表

Dual-mode radio frequency/microwave plasma deposition of amorphous silicon oxide thin films

R. Brenot, M. Kildemo, B. Drévillon, 1995 .

Optical and compositional study of silicon oxide thin films deposited in a dual-mode (microwave/radiofrequency) plasma-enhanced chemical vapor deposition reactor

J. Perrin, D. Ballutaud, R. Etemadi, 1998 .

Local order and H-bonding in N-rich amorphous silicon nitride

A. Gheorghiu, C. Sénémaud, M. Fang, 1993 .

Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films

J. Perrin, C. Clerc, B. Drévillon, 1996 .

Possible routes for cluster growth and particle formation in RF silane discharges

J. Perrin, R. Etemadi, A. Lloret, 1994 .

Phenomenology of a dual-mode microwave/RF discharge used for the deposition of silicon oxide thin layers

J. Perrin, R. Etemadi, C. Godet, 1997 .

Dual-plasma reactor for low temperature deposition of wide band-gap silicon alloys

J. Perrin, B. Drévillon, R. Etemadi, 1997 .

The origin of visible photoluminescence from silicon oxide thin films prepared by dual-plasma chemical vapor deposition

R. Wehrspohn, D. Ballutaud, R. Etemadi, 1998 .

Silicon-based, protective transparent multilayer coatings deposited at high rate on optical polymers by dual-mode MW/r.f. PECVD

B. Drévillon, V. Yakovlev, R. Etemadi, 1993 .

Highly homogeneous silica coatings for optical and protective applications deposited by PECVD at room temperature in a planar uniform distributed electron cyclotron resonance plasma reactor.

J. Pelletier, R. Etemadi, T. Lagarde, 1995 .

Optical and luminescence properties of polymer-like a-C:H films deposited in a dual-mode PECVD reactor

B. Drévillon, R. Etemadi, C. Godet, 1996 .