K. Matsunaga

发表

Hydrogen Production by High Temperature Electrolysis with Nuclear Reactor

S. Makino, T. Ogawa, Fujiwara Seiji, 2008 .

Application of Extreme Ultraviolet Lithography to Test Chip Fabrication

H. Aoyama, S. Magoshi, Satoshi Tanaka, 2011 .

The Effect of Strain Distribution on Abnormal Grain Growth in Cu Thin Films

S. Tsukimoto, M. Moriyama, M. Murakami, 2004 .

The effect of strain on abnormal grain growth in Cu thin films

M. Moriyama, M. Murakami, K. Matsunaga, 2003 .

Melt Differentiation Induced by Zonal Structure Formation of Calcium Aluminoferrite in a CaO–SiO2–Al2O3–Fe2O3 Pseudoquaternary System

K. Matsunaga, K. Fukuda, Hideto Yoshida, 2005 .

Performance of EUV molecular resists based on fullerene derivatives

Koji Kaneyama, Julius Joseph Santillan, Toshiro Itani, 2011, Advanced Lithography.

Development status of EUV resist materials and processing at Selete

Koji Kaneyama, Toshiro Itani, Hiroaki Oizumi, 2011, Advanced Lithography.

Alternative resist processes for LWR reduction in EUVL

Koji Kaneyama, Julius Joseph Santillan, Toshiro Itani, 2010, Advanced Lithography.

Progress of resist materials and process for hp 2x-nm devices using EUV lithography

Koji Kaneyama, Kazuyuki Matsumaro, Julius Joseph Santillan, 2010 .

Development of resist material and process for hp-2x-nm devices using EUV lithography

Koji Kaneyama, Kazuyuki Matsumaro, Julius Joseph Santillan, 2010, Advanced Lithography.

Nuclear Hydrogen Production by High-Temperature Electrolysis

S. Makino, T. Ogawa, Fujiwara Seiji, 2009 .