G. Murdoch
发表
A. Jourdain,
K. Rebibis,
Andy Miller,
2013,
2013 IEEE 63rd Electronic Components and Technology Conference.
Q. Le,
G. Murdoch,
F. Holsteyns,
2019,
Microelectronic Engineering.
Christopher J. Wilson,
Christoph Adelmann,
Monique Ercken,
2018,
2018 IEEE International Interconnect Technology Conference (IITC).
Christopher J. Wilson,
O. Pedreira,
Z. Tokei,
2020,
2020 IEEE International Interconnect Technology Conference (IITC).
K. Croes,
N. Heylen,
Liping Zhang,
2016
.
N. Heylen,
Z. Tokei,
S. De Gendt,
2015,
2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM).
N. Heylen,
Liping Zhang,
Z. Tokei,
2015
.
Eric Beyne,
Luka Kljucar,
Ingrid De Wolf,
2017,
Microelectron. Reliab..
Z. Tokei,
Souvik Kundu,
Q. Le,
2022,
2022 IEEE International Interconnect Technology Conference (IITC).
K. Devriendt,
K. Sankaran,
G. Pourtois,
2020,
2020 IEEE International Electron Devices Meeting (IEDM).
Shankar Kumar Selvaraja,
Wim Bogaerts,
Joris Van Campenhout,
2012
.
Eric Beyne,
Ingrid De Wolf,
Mario Gonzalez,
2016,
2016 IEEE 66th Electronic Components and Technology Conference (ECTC).
H. Mertens,
K. Devriendt,
J. Geypen,
2021,
2021 IEEE International Electron Devices Meeting (IEDM).
H. Mertens,
Z. Tao,
G. Mannaert,
2022,
Advanced Lithography.
N. Horiguchi,
N. Jourdan,
N. Heylen,
2022,
International Interconnect Technology Conference.
H. Mertens,
Z. Tao,
K. Devriendt,
2020,
2020 IEEE International Electron Devices Meeting (IEDM).
V. V. Gonzalez,
H. Mertens,
L. Ragnarsson,
2023,
Advanced Lithography.
D. Tsvetanova,
N. Horiguchi,
J. Ryckaert,
2022,
International Electron Devices Meeting.
V. V. Gonzalez,
J. Ryckaert,
N. Jourdan,
2023,
2023 IEEE International Interconnect Technology Conference (IITC) and IEEE Materials for Advanced Metallization Conference (MAM)(IITC/MAM).
D. Tsvetanova,
O. Pedreira,
Z. Tokei,
2022,
2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits).
Christopher J. Wilson,
Z. Tokei,
K. Gavan,
2017,
2017 IEEE International Interconnect Technology Conference (IITC).
EPE analysis of sub-N10 BEoL flow with and without fully self-aligned via using Coventor SEMulator3D
William W. Clark,
Sandip Halder,
Matt Gallagher,
2017,
Advanced Lithography.