S. Gaugiran

发表

Double-patterning requirements for optical lithography and prospects for optical extension without double patterning

S. Barnola, M. McCallum, C. Lapeyre, 2009 .

Leaching mechanisms in immersion lithography with or without top coat

S. Gaugiran, R. Feilleux, C. Sourd, 2007 .

Thermal characterization of materials for double patterning

P. Trefonas, Y. Bae, G. Barclay, 2010 .

Materials for double patterning strategies: Development and application

C. Szmanda, C. Lapeyre, P. Trefonas, 2009 .

GaN Rods Grown on Si by SAG-HVPE toward GaN HVPE/InGaN MOVPE Core/Shell Structures

C. Bougerol, B. Gayral, A. Dussaigne, 2016 .

A Wafer Level approach for led packaging using TSV last technology

D. Henry, S. Gaugiran, S. Borel, 2015, 2015 IEEE 65th Electronic Components and Technology Conference (ECTC).

LENS (lithography enhancement toward nano scale): a European project to support double exposure and double patterning technology development

Hiroyuki Miyashita, Olivier Toublan, Xavier Buch, 2010, Advanced Lithography.

Guided self-assembly of block-copolymer for CMOS technology: a comparative study between grapho-epitaxy and surface chemical modification

Raluca Tiron, Xavier Chevalier, Francesc Perez-Murano, 2011, Advanced Lithography.

Optical manipulation of microparticles and cells on silicon nitride waveguides.

J Fedeli, J. Fédéli, A. Fuchs, 2005, Optics express.

Optical manipulation of gold micro and nano-particles on silicon nitride waveguides: impact of polarization and particle size on gradient forces

Stéphane Gétin, Jean-Marc Fedeli, Jacques Derouard, 2007, SPIE OPTO.

Method for sorting particles.

G. Colas, S. Getin, S. Gaugiran, 2003 .

A separation object optically.

G. Colas, S. Getin, S. Gaugiran, 2003 .