K. Guinn

发表

WDM Source Based on High-Power, Efficient 1280-nm DFB Lasers for Terabit Interconnect Technologies

K. Bergman, L. Johansson, S. Fryslie, 2018, IEEE Photonics Technology Letters.

Copper CVD Reactions of Cu(I)(hfae)(vtms) Adsorbed on TiN

V. M. Donnelly, I. Petrov, J. Greene, 1992 .

Chemical challenge of submicron oxide etching

K. Guinn, J. A. Taylor, S. McNevin, 1997 .

Power scaling diode lasers to high-brightness kW systems

K. Guinn, B. Acklin, D. Schleuning, 2013, 2013 High Power Diode Lasers and Systems Conference (HPD).

40 Gbit/s lumped-element modulator driver in GaAs pHEMTs

K. C. Wang, V. Radisic, K. Guinn, 2003 .

Quantitative chemical topography of polycrystalline Si anisotropically etched in Cl2/O2 high density plasmas

V. M. Donnelly, K. Guinn, C. C. Cheng, 1995 .

In situ pulsed laser‐induced thermal desorption studies of the silicon chloride surface layer during silicon etching in high density plasmas of Cl2 and Cl2/O2 mixtures

V. M. Donnelly, I. Herman, K. Guinn, 1994 .

Comparison of advanced plasma sources for etching applications. V. Polysilicon etching rate, uniformity, profile control, and bulk plasma properties in a helical resonator plasma source

F. Klemens, J.T.-C. Lee, H. Maynard, 1996 .

Thermal desorption in the pressure gap and at high pressure using a Micro Knudsen Effusion Cell

K. Guinn, R. Herz, 1992 .

Surface chemistry during plasma etching of silicon

V. M. Donnelly, I. Herman, K. Guinn, 1996 .

Chemical topography of anisotropic etching of polycrystalline Si masked with photoresist

V. M. Donnelly, K. Guinn, 1994 .

Cl2 Plasma — Si Surface Interactions in Plasma Etching: X-ray Photoelectron Spectroscopy After Etching, and Optical and Mass Spectrometry Methods During Etching

V. M. Donnelly, I. Herman, K. Guinn, 1997 .

Mechanism for anisotropic etching of photoresist‐masked, polycrystalline silicon in HBr plasmas

V. M. Donnelly, K. Guinn, C. Cheng, 1996 .

Competitive halogenation of silicon surfaces in HBr/Cl2 plasmas studied with x‐ray photoelectron spectroscopy and in situ, real‐time, pulsed laser‐induced thermal desorption

V. M. Donnelly, I. Herman, K. Guinn, 1995 .

Decomposition of hexafluoroacetylacetonate Cu(I) vinyltrimethylsilane on, and diffusion of Cu into single crystal and polycrystalline titanium nitride

Vincent M. Donnelly, K. V. Guinn, V. M. Donnelly, 1993 .

Chemical Vapor Deposition of SiO 2 from Ozone-Organosilane Mixtures near Atmospheric Pressure

K. Guinn, J. Mucha, 1992 .

Surface Analysis during Plasma Etching by Laser-Induced Thermal Desorption

V. M. Donnelly, I. Herman, K. Guinn, 1996 .