Tsuyoshi Furukawa

Material Development for ArF Immersion Extension towards Sub-20nm Node

Tsuyoshi Furukawa, Kousuke Terayama, Takeo Shioya, 2013 .

Strategies to enable directed self-assembly contact hole shrink for tight pitches

Nelson Felix, Martha I. Sanchez, Cheng Chi, 2016, SPIE Advanced Lithography.

DSA patterning options for logics and memory applications

Akiteru Ko, John Arnold, Nelson Felix, 2017, Advanced Lithography.

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle

Yongan Xu, John Arnold, Nelson Felix, 2017, Advanced Lithography.

DSA via hole shrink for advanced node applications

Nelson Felix, Kafai Lai, Martha I. Sanchez, 2016, SPIE Advanced Lithography.

Encountered-type Visual Haptic Display Using Flexible Sheet

Tatsuo Arai, Tomohito Takubo, Kenji Inoue, 2007, Proceedings 2007 IEEE International Conference on Robotics and Automation.