H. Yang

Atomic-Layer-Deposited SiOx/SnOx Nanolaminate Structure for Moisture and Hydrogen Gas Diffusion Barriers.

Jin-seong Park, H. Park, Seunghwan Lee, 2021, ACS applied materials & interfaces.

A study on the growth mechanism and gas diffusion barrier property of homogeneously mixed silicon–tin oxide by atomic layer deposition

Jin-seong Park, Seunghwan Lee, Ju-Hwan Han, 2021, Ceramics International.

Thermally Annealed Molecular Layer‐Deposited Indicone: Structural Analysis and Area Selective Deposition Application

Bonggeun Shong, H. Yang, Jinsin Park, 2022, Advanced Materials Interfaces.

Atomic layer deposition of molybdenum oxide using (N Bu)2(NMe2)2Mo, hydrogen peroxide (H2O2), and ozone (O3) for DRAM application

Hanjin Lim, H. Yang, Jinsin Park, 2022, Ceramics International.

Water vapor and hydrogen gas diffusion barrier characteristics of Al2O3-alucone multi-layer structures for flexible OLED display applications.

Jin-seong Park, Tae-Yeon Kim, Ju-Hwan Han, 2021, Dalton transactions.

Review of molecular layer deposition process and application to area selective deposition via graphitization

H. Yang, Jinsin Park, Geonho Baek, 2023, Japanese Journal of Applied Physics.

Kinetic modeling for direct synthesis of dimethyl ether from syngas over a hybrid Cu/ZnO/Al2O3/ferrierite catalyst

J. Bae, Jongmin Park, Myung-June Park, 2020, Catalysis Today.

Silicon oxynitride thin films by plasma-enhanced atomic layer deposition using a hydrogen-free metal-organic silicon precursor and N2 plasma

Tae-Yeon Kim, H. Yang, Yongjoo Park, 2023, Materials Science in Semiconductor Processing.