Boer Zhu

High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix

Xiang-zhao Wang, Sikun Li, Boer Zhu, 2019, Optics Communications.

Fast thermal aberration model for lithographic projection lenses.

Xiang-zhao Wang, Sikun Li, Boer Zhu, 2019, Optics express.

Computational lithographic study of 0.55 NA EUV single patterning for metal layers for the 2nm logic node and beyond

A. Yen, J. Zimmermann, Chun-Kuang Chen, 2022, Advanced Lithography.