Soichi Owa

Direct overwrite by short pulses on double-layered MO media

Tomoko Ohtsuki, Soichi Owa, Fumiaki Yamada, 1990, Other Conferences.

Dry and F-doped fused silica for photomask substrate in 157-nm lithography

Soichi Owa, Naomasa Shiraishi, Hiroki Jinbo, 1999, Photomask Technology.

Current status of water immersion lithography and prospect of higher index method

Martin McCallum, Yasuhiro Ohmura, Katsushi Nakano, 2007, European Mask and Lithography Conference.

Immersion defectivity control by optimizing immersion materials and processes

Katsushi Nakano, Soichi Owa, Hiroshi Kato, 2007, SPIE Advanced Lithography.

Feasibility studies of source and mask optimization

Tomoyuki Matsuyama, Toshiharu Nakashima, Soichi Owa, 2009, Lithography Asia.

Immersion defectivity study with volume production immersion lithography tool

Yasuhiro Iriuchijima, Katsushi Nakano, Tomoharu Fujiwara, 2007, SPIE Advanced Lithography.

Evolution of wavelength shrinkage in lithography

Martin McCallum, Masaomi Kameyama, Soichi Owa, 2009, International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT).