N. Yoshioka

Advanced Optical Masks

N. Yoshioka, 2005 .

Practical attenuated phase-shifting mask with a single-layer absorptive shifter of MoSiO and MoSiON for ULSI fabrication

H. Morimoto, H. Kusunose, J. Miyazaki, 1993, Proceedings of IEEE International Electron Devices Meeting.

Advanced FIB mask repair technology for 100 nm/ArF lithography

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, 2001, Photomask Technology.

Fabrication of surface acoustic wave devices by using x‐ray lithography

Hiroaki Morimoto, Nobuyuki Yoshioka, Yaichiro Watakabe, 1989 .

The novel approach for optical proximity correction using genetic algorithms

Osamu Suga, Nobuyuki Yoshioka, Tsuneo Terasawa, 2005, SPIE Photomask Technology.

Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process

Nobuyuki Yoshioka, Yoichi Akasaka, Yaichiro Watakabe, 1992 .

A High Performance Negative X-Ray Resist : CPMS-X(Pd)

Nobuyuki Yoshioka, Yoshiki Suzuki, Teruhiko Yamazaki, 1985, Advanced Lithography.

Design and characterization of 3 μm bubble memory chips utilizing Y‐Y patterns

A. Morimoto, N. Yoshioka, H. Urai, 1978 .

4Mb on-chip-cache bubble memory chips with 4 µm period ion-implanted propagation patterns

N. Yoshioka, H. Gokan, H. Urai, 1984 .