K. Hosono

Practical attenuated phase-shifting mask with a single-layer absorptive shifter of MoSiO and MoSiON for ULSI fabrication

H. Morimoto, H. Kusunose, J. Miyazaki, 1993, Proceedings of IEEE International Electron Devices Meeting.

Fabrication of surface acoustic wave devices by using x‐ray lithography

Hiroaki Morimoto, Nobuyuki Yoshioka, Yaichiro Watakabe, 1989 .

Super low noise HEMT using focused ion beam lithography

H. Morimoto, K. Hosono, T. Katoh, 1988 .

A high electron mobility transistor with a mushroom gate fabricated by focused ion beam lithography

K. Hosono, T. Katoh, M. Komaru, 1988, 1988., IEEE MTT-S International Microwave Symposium Digest.

Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process

Nobuyuki Yoshioka, Yoichi Akasaka, Yaichiro Watakabe, 1992 .

GaAs FET Mushroom Gate Fabricated By FIB/EB Hybrid Lithography

Kunihiro Hosono, Hiroaki Morimoto, H. Minami, 1989, Advanced Lithography.

Photomask and Next-Generation Lithography Mask Technology XVII

Kunihiro Hosono, K. Hosono, 2009 .