Richard M. Silver

发表

Imaging simulations of optimized overlay marks with deep sub-resolution features

Daniel Kandel, Vladimir Levinski, Michael E. Adel, 2006, SPIE Advanced Lithography.

Overlay measurements and standards

James E. Potzick, Richard M. Silver, Robert D. Larrabee, 1995, Advanced Lithography.

Comparison of edge detection methods using a prototype overlay calibration artifact

Richard M. Silver, Jau-Shi Jay Jun, Edward Kornegay, 2001, SPIE Advanced Lithography.

Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression

Hui Zhou, Bryan M. Barnes, Nien Fan Zhang, 2015, Advanced Lithography.

Applications of machine learning at the limits of form-dependent scattering for defect metrology

Bryan M. Barnes, Mark-Alexander Henn, Hui Zhou, 2019, Advanced Lithography.

Developing a method to determine linewidth based on counting the atom spacings across a line

Carsten P. Jensen, John S. Villarrubia, Richard M. Silver, 1998, Advanced Lithography.

New method to enhance overlay tool performance

Egon Marx, Mark P. Davidson, Richard M. Silver, 2003, SPIE Advanced Lithography.

Use of Bayesian Statistics to Improve Optical Measurement Uncertainty by Combined Multi-Tool Metrology

Hui Zhou, Bryan M. Barnes, Richard M. Silver, 2015 .

A Macro-Micro Motion System for a STM

Hui Zhou, James D. Gilsinn, Richard M. Silver, 2002 .

Evaluation of New In-Chip and Arrayed Line Overlay | NIST

Mark P. Davidson, Richard M. Silver, Robert D. Larrabee, 2004 .

Evaluation of new in-chip and arrayed line overlay target designs

Egon Marx, Mark P. Davidson, Richard M. Silver, 2004, SPIE Advanced Lithography.

New Method to Enhance Overlay Tool Performance | NIST

Egon Marx, Mark P. Davidson, Richard M. Silver, 2003 .

Silicon-based quantum computing: manufacturing and metrology challenges (Conference Presentation)

Richard M. Silver, 2019 .

Nested uncertainties and hybrid metrology to improve measurement accuracy

Hui Zhou, Jing Qin, Bryan M. Barnes, 2011, Advanced Lithography.

Model-based analysis of the limits of optical metrology with experimental comparisons

Egon Marx, Richard M. Silver, Ravikiran Attota, 2007, SPIE Optical Metrology.

Optical critical dimension measurement and illumination analysis using the through-focus focus metric

Ronald G. Dixson, Richard M. Silver, Ravikiran Attota, 2006, SPIE Advanced Lithography.

Multiple-order imaging for optical critical dimension metrology using microscope characterization

Hui Zhou, Jing Qin, Bryan M. Barnes, 2012, Other Conferences.

Optical through-focus technique that differentiates small changes in line width, line height, and sidewall angle for CD, overlay, and defect metrology applications

Bryan M. Barnes, Richard M. Silver, Ravikiran Attota, 2008, SPIE Advanced Lithography.

Calibration strategies for overlay and registration metrology

Egon Marx, Mark P. Davidson, Richard M. Silver, 2003, SPIE Advanced Lithography.

Focus and edge detection algorithms and their relevance to the development of an optical overlay calibration standard

Mario Dagenais, Richard M. Silver, Edward Kornegay, 1999, Advanced Lithography.

USE OF A BAYESIAN APPROACH TO IMPROVE UNCERTAINTY OF MODEL-BASED MEASUREMENTS BY HYBRID MULTI-TOOL METROLOGY

Hui Zhou, Bryan M. Barnes, Nien Fan Zhang, 2015 .

Method to characterize overlay tool misalignments and distortions

James E. Potzick, Christopher J. Evans, Richard M. Silver, 1997, Advanced Lithography.

High Accuracy Overlay Measurements | NIST

James E. Potzick, Richard M. Silver, Robert D. Larrabee, 1996 .

Assessing the wavelength extensibility of optical patterned defect inspection

Martin Y. Sohn, Bryan M. Barnes, Mark-Alexander Henn, 2017, Advanced Lithography.

Angle-resolved optical metrology using multi-technique nested uncertainties

Hui Zhou, Bryan M. Barnes, Ronald G. Dixson, 2009, Optical Metrology.

Optical illumination and critical dimension analysis using the through-focus focus metric method

Richard M. Silver, Ravikiran Attota, James Potzick, 2006, SPIE Optics + Photonics.

Overlay tool comparison for sub-130-nm technologies

Richard M. Silver, Michael Bishop, Beth Russo, 2002, SPIE Advanced Lithography.

Appraising the extensibility of optics-based metrology for emerging materials

Hui Zhou, Martin Y. Sohn, Bryan M. Barnes, 2019 .

Metrology, Inspection, and Process Control for Microlithography XVIII

Richard M. Silver, R. Silver, 2005 .

Assessing Quantitative Optical Imaging for Realizing In-die Critical Dimension Metrology | NIST

Hui Zhou, Martin Y. Sohn, Bryan M. Barnes, 2017 .

Optical linewidth models: then and now

Mark P. Davidson, Richard M. Silver, Robert D. Larrabee, 1999, Advanced Lithography.

3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization | NIST

Hui Zhou, Jing Qin, Bryan M. Barnes, 2013 .

Optimal compression and binarization of signature profiles for automated bullet identification systems

Wei Chu, Jun-Feng Song, Theodore V. Vorburger, 2010, Scanning Microscopies.

Overlay Measurements and Standards | NIST

James E. Potzick, Richard M. Silver, Robert D. Larrabee, 1995 .

Improving optical measurement accuracy using multi-technique nested uncertainties

Hui Zhou, Bryan M. Barnes, Ronald G. Dixson, 2009, Advanced Lithography.