Kiyoshi Hattori

发表

Processing apparatus with an automatic re-start function

Masayuki Sugahara, Hitoshi Ozawa, Kiyoshi Hattori, 1992 .

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Hiroaki Suzuki, Yoshio Suzuki, Ryoichi Hirano, 1999, Photomask and Next Generation Lithography Mask Technology.

Linewidth controllability depending on electron-beam blur and resist thickness

Shunko Magoshi, Masamitsu Itoh, Atsushi Ando, 1998, Advanced Lithography.

Solution for 100 nm: EBM-4000

Hirohiko Honda, Noriaki Nakayamada, Satoshi Yasuda, 2002, Photomask Japan.

Solution for 100nm - EBM-4000

Hirohiko Honda, Noriaki Nakayamada, Satoshi Yasuda, 2002 .

Multi-beam mask writer MBM-1000 and its application field

Hirofumi Morita, Hirokazu Yamada, Munehiro Ogasawara, 2016, Photomask Japan.

Improvement of the Damping Constants for Seismic Design of Piping System for NPP

Masaki Nakagawa, Takashi Satoh, Kei Kobayashi, 2002 .

Stage tracking of a mask-scan EB mask writer test stand

Jun Takamatsu, Seiichi Tsuchiya, Munehiro Ogasawara, 2002, SPIE Photomask Technology.

Eddy current evaluation for a high-resolution EB system

Jun Takamatsu, Munehiro Ogasawara, Shusuke Yoshitake, 2001, SPIE Photomask Technology.

Beam-monitoring system using microapertures for electron-beam lithography

Jun Takamatsu, Munehiro Ogasawara, Tetsuro Nakasugi, 2000, Advanced Lithography.

EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond

Kenichi Saito, Hiroyoshi Ando, Takashi Kamikubo, 2011, Photomask Technology.

Optical column of the mask-scan EB mask writer test stand

Jun Takamatsu, Munehiro Ogasawara, Shusuke Yoshitake, 2000, Photomask Japan.

Seismic Proving Test of Heavy Component with Energy Absorbing Supports

T. Iwatsubo, Katsuhiko Kuroda, Naoyuki Adachi, 2001 .

Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation

Hirokazu Yamada, Takashi Kamikubo, Munehiro Ogasawara, 2014, European Mask and Lithography Conference.

EB alignment function for defect mitigation of EUV blank

Munehiro Ogasawara, Shusuke Yoshitake, Tomohiro Iijima, 2012, Other Conferences.

Electron-beam mask writer EBM-6000 for 45 nm HP node

Yusuke Sakai, Jun Yashima, Noriaki Nakayamada, 2007, Photomask Japan.

Koehler-illumination-based method to improve beam size controllability

Atsushi Ando, Hitoshi Sunaoshi, Kiyoshi Hattori, 1998, Advanced Lithography.

Enhancement of global CD correction and data processing in EB mask writer EBM-8000

Yasuo Kato, Jun Yashima, Noriaki Nakayamada, 2011, Photomask Technology.

Coping with double-patterning/exposure lithography by EB mask writer EBM-6000

Jun Takamatsu, Takashi Kamikubo, Shuichi Tamamushi, 2007, SPIE Photomask Technology.

Proposal of an extended loading effect correction for EBM-8000

Yasuo Kato, Noriaki Nakayamada, Kiyoshi Hattori, 2012, Photomask Technology.

Seismic Proving Test for Concrete Containment Vessels(II.RCCV) : Part 3. Building Procedure of RCCV 1/8 Scale Test Model

Katsuki Takiguchi, Kiyoshi Hattori, Hiroshi Akiyama, 1998 .

Electron‐beam direct writing system EX‐8D employing character projection exposure method

M. Kanoh, Kiyoshi Hattori, Hideo Kusakabe, 1993 .

Contamination Charging up Effect in a Variably Shaped Electron Beam Writer

Shunko Magoshi, Atsushi Ando, Hitoshi Sunaoshi, 1996 .

Evaluation of Shaping Gain Adjustment Accuracy Using Atomic Force Microscope in Variably Shaped Electron-Beam Writing Systems

Shuichi Tamamushi, Hitoshi Sunaoshi, Kiyoshi Hattori, 1997 .

Fabrication of Micro-Marks for Electron-Beam Lithography

Tetsuro Nakasugi, Hitoshi Sunaoshi, Naoharu Shimomura, 1997 .

A high accuracy and high throughput electron beam reticle writing system for 16M dynamic random access memory class and beyond devices

Osamu Ikenaga, Fumiaki Shigemitsu, Hirohito Anze, 1990 .

Initial results of a 50 kV electron beam writer EBM-4000 for a 90 nm node photomask

Kiyoshi Hattori, Kenichi Murooka, Osamu Numazu Iizuka, 2003 .