Koji Kaneyama

发表

In-situ analysis of defect formation in coat develop track process

Masahiko Harumoto, Harold Stokes, Osamu Tamada, 2014, Advanced Lithography.

Investigation of coat-develop track system for EUV resist processing

Masahiko Harumoto, Osamu Tamada, Tadashi Miyagi, 2013, Advanced Lithography.

EUV resist processing with flash-lamp

Koji Kaneyama, Masaya Asai, Julius Joseph Santillan, 2012, Other Conferences.

Study of post-develop defect on typical EUV resist

Masahiko Harumoto, Koji Kaneyama, Masaya Asai, 2010, Advanced Lithography.

EUV negative-resist based on thiol-yne system

Koji Kaneyama, Toshiro Itani, Masamitsu Shirai, 2011, Advanced Lithography.

Coat-develop track process for inorganic EUV resist

Masahiko Harumoto, Tadashi Miyagi, Koji Kaneyama, 2012, Advanced Lithography.

Study of post-develop defect on typical EUV resist

Masahiko Harumoto, Tadashi Miyagi, Koji Kaneyama, 2011, Advanced Lithography.

EUV resist processing in vacuum

Koji Kaneyama, Shinji Kobayashi, Toshiro Itani, 2009, Advanced Lithography.

DSA process window expansion with novel DSA track hardware

Yuji Tanaka, Masahiko Harumoto, Harold Stokes, 2017, Advanced Lithography.

EUV resist based on low molecular weight PHS

Koji Kaneyama, Toshiro Itani, Masamitsu Shirai, 2008, SPIE Advanced Lithography.

EUV process improvement with novel litho track hardware

Yuji Tanaka, Masahiko Harumoto, Harold Stokes, 2017, Advanced Lithography.

EUV resist dissolution optimization for CD uniformity and defect control in coat develop track process

Masahiko Harumoto, Harold Stokes, Osamu Tamada, 2014, Advanced Lithography.

Application of flash-lamp post-exposure baking for EUV resist processing

Koji Kaneyama, Toshiro Itani, T. Itani, 2011, Advanced Lithography.

Highly sensitive EUV-resist based on thiol-ene radical reaction

Koji Kaneyama, Toshiro Itani, Masamitsu Shirai, 2010, Advanced Lithography.

Surface roughness of molecular resist for EUV lithography

Minoru Toriumi, Koji Kaneyama, Shinji Kobayashi, 2008, SPIE Advanced Lithography.

Development of EUV resists at Selete

Koji Kaneyama, Shinji Kobayashi, Toshiro Itani, 2009, Advanced Lithography.

Current benchmarking results of EUV resist at Selete

Koji Kaneyama, Daisuke Kawamura, Toshiro Itani, 2008, Lithography Asia.

Fundamental study of spin-coating using in-situ analysis and simulation

Yuji Tanaka, Masahiko Harumoto, Harold Stokes, 2015, Advanced Lithography.

Development status of EUV resist materials and processing at Selete

Koji Kaneyama, Toshiro Itani, Hiroaki Oizumi, 2011, Advanced Lithography.

Improving process and system for EUV coat-develop track

Masahiko Harumoto, Harold Stokes, Tadashi Miyagi, 2015, Advanced Lithography.

EUV resist development in Selete

Koji Kaneyama, Shinji Kobayashi, Julius Joseph Santillan, 2008, SPIE Advanced Lithography.

LWR and defectivity improvement on EUV track system

Masahiko Harumoto, Harold Stokes, Koji Kaneyama, 2016, SPIE Advanced Lithography.

Development of resist material and process for hp-2x-nm devices using EUV lithography

Koji Kaneyama, Kazuyuki Matsumaro, Julius Joseph Santillan, 2010, Advanced Lithography.

Optimizing CD uniformity by total PEB cycle temperature control on track equipment

Koji Kaneyama, Akihiro Hisai, Charles Pieczulewski, 2002, SPIE Advanced Lithography.

Performance of EUV molecular resists based on fullerene derivatives

Koji Kaneyama, Julius Joseph Santillan, Toshiro Itani, 2011, Advanced Lithography.

Investigation of coat-develop track system for placement error of contact hole shrink process

Yuji Tanaka, Masahiko Harumoto, Harold Stokes, 2016, SPIE Advanced Lithography.

Development of EUV resists based on various new materials

Koji Kaneyama, Kazuyuki Matsumaro, Julius Joseph Santillan, 2010, Advanced Lithography.

Alternative resist processes for LWR reduction in EUVL

Koji Kaneyama, Julius Joseph Santillan, Toshiro Itani, 2010, Advanced Lithography.

Advancements in EUV Resist Materials and Processing

Koji Kaneyama, Daisuke Kawamura, Hiroaki Oizumi, 2009 .

Dissolution characteristics of chemically amplified extreme ultraviolet resist

Koji Kaneyama, Toshiro Itani, Takahiro Kozawa, 2008 .

Progress of resist materials and process for hp 2x-nm devices using EUV lithography

Koji Kaneyama, Kazuyuki Matsumaro, Julius Joseph Santillan, 2010 .