Thomas Käsebier

发表

Anti-reflective sub-wavelength structures at a wavelength of 441.6 nm for phase masks of near-field lithography

Thomas Käsebier, Jinyu Li, Ying Liu, 2016, SPIE/COS Photonics Asia.

Black silicon for solar cell applications

Thomas Käsebier, Andreas Tünnermann, Thomas Pertsch, 2012, Photonics Europe.

High contrast gratings for high-precision metrology

Thomas Käsebier, Andreas Tünnermann, Stefanie Kroker, 2013, Photonics West - Optoelectronic Materials and Devices.

Diffractive optical elements based on subwavelength high-contrast gratings

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2012, Other Conferences.

Large area gold coated nano-needles fabricated by proximity mask aligner lithography for plasmonic AR-structures

Thomas Käsebier, Dirk Michaelis, Peter Dannberg, 2016, SPIE Photonics Europe.

Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography

Thomas Käsebier, Uwe D. Zeitner, Ernst-Bernhard Kley, 2015, Advanced Lithography.

Novel fabrication technique of continuous profiles for microoptics and integrated optics

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2005, SPIE Optical Systems Design.

Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography

Thomas Käsebier, Ying Liu, Keqiang Qiu, 2016, SPIE/COS Photonics Asia.

Asymmetric direction selective filter elements based on high-contrast gratings

Thomas Käsebier, Andreas Tünnermann, Frank Fuchs, 2013, Photonics West - Optoelectronic Materials and Devices.

Self-organized, effective medium black silicon antireflection structures for silicon optics in the mid-infrared

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2016, NanoScience + Engineering.

Investigation on the angular dependent reflectance of coupled high-contrast gratings

Thomas Käsebier, Andreas Tünnermann, Stefanie Kroker, 2014, Photonics West - Optoelectronic Materials and Devices.

Novel direction selective filter elements based on high-contrast gratings

Thomas Käsebier, Andreas Tünnermann, Frank Fuchs, 2012, Other Conferences.

Black Silicon Photovoltaics

Thomas Käsebier, Andreas Tünnermann, Thomas Pertsch, 2012, Photonics Europe.

Resolution limits of transmission optics for x-ray astronomy

Thomas Käsebier, Andreas Tünnermann, Vadim Burwitz, 2012, Other Conferences.

Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

Thomas Käsebier, Ernst-Bernhard Kley, Yannick Bourgin, 2016, Advanced Lithography.

High frequency binary amorphous silicon grating working as wire grid polarizer for UV applications

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2012, Other Conferences.

Tuning the reflectivity of high-contrast gratings based on silicon and silica by means of wet etching with hydrofluoric acid

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2012, Other Conferences.

Optical modeling of needle like silicon surfaces produced by an ICP-RIE process

Thomas Käsebier, Andreas Tünnermann, Thomas Pertsch, 2010, Photonics Europe.

Black-silicon-structured back-illuminated Ge-on-Si photodiode arrays

Thomas Käsebier, Uwe D. Zeitner, Martin Steglich, 2019, Optics + Optoelectronics.

High efficiency two-dimensional grating reflectors with angularly tunable polarization efficiency

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2013 .

Ge-on-Si photodiode with black silicon boosted responsivity

Thomas Käsebier, Andreas Tünnermann, Jörg Schulze, 2015 .

Tungsten wire grid polarizer for applications in the DUV spectral range.

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2012, Applied optics.

An ultra‐black silicon absorber

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2014 .

Angular bandpass filters based on dielectric resonant waveguide gratings.

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2012, Optics express.

Silicon wire grid polarizer for ultraviolet applications.

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2014, Applied optics.

Conformal Transparent Conducting Oxides on Black Silicon

Thomas Käsebier, Matthias Kroll, Martin Otto, 2010, Advanced materials.

Iridium wire grid polarizer fabricated using atomic layer deposition

Thomas Käsebier, Andreas Tünnermann, Adriana Szeghalmi, 2011, Nanoscale research letters.

High aspect ratio deep UV wire grid polarizer fabricated by double patterning

Thomas Käsebier, Andreas Tünnermann, Adriana Szeghalmi, 2012 .

Extremely low surface recombination velocities in black silicon passivated by atomic layer deposition

Thomas Käsebier, Andreas Tünnermann, Ralf B. Wehrspohn, 2012 .

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography.

Thomas Käsebier, Adriana Szeghalmi, Ernst-Bernhard Kley, 2015, Optics express.

Coupled grating reflectors with highly angular tolerant reflectance.

Thomas Käsebier, Andreas Tünnermann, Ernst-Bernhard Kley, 2013, Optics letters.