A. Erdmann

发表

Acid diffusion effects between resists in freezing processes used for contact hole patterning

J. Fuhrmann, A. Fiebach, P. Trefonas, 2010 .

A. Erdmann, T. Fühner, P. Evanschitzky, 2015 .

Impact of exposure induced refractive index changes of photoresists on the photolithographic process

C. Willson, C. Henderson, A. Erdmann, 2001 .

Rigorous electromagnetic field mask modeling and related lithographic effects in the low k1 and ultrahigh numerical aperture regime

A. Erdmann, P. Evanschitzky, 2007 .

Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography

A. Erdmann, T. Fühner, P. Evanschitzky, 2010 .

Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography

A. Erdmann, T. Fühner, P. Evanschitzky, 2011 .

Mask aligner lithography simulation - From lithography simulation to process validation

U. Hofmann, P. Hudek, M. Hornung, 2012 .

Aberration measurement technique based on an analytical linear model of a through-focus aerial image.

Xiang-zhao Wang, Sikun Li, A. Erdmann, 2014, Optics express.

Compensation of mask induced aberrations by projector wavefront control

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2011, Advanced Lithography.

Investigation of high-resolution contact printing

B. Meliorisz, P. Hudek, A. Erdmann, 2008 .

Optimization of illumination pupils and mask structures for proximity printing

B. Meliorisz, U. Hofmann, P. Hudek, 2010 .

Simulation of light propagation in optical linear and nonlinear resist layers by finite difference beam propagation and other methods

A. Erdmann, W. Henke, A. Erdmann, 1996 .

Simulation of proximity and contact lithography

B. Meliorisz, A. Erdmann, P. Evanschitzky, 2007 .

Beam-propagation in magnetooptic waveguides

A. Erdmann, P. Hertel, 1995 .

Pixel-based defect detection from high-NA optical projection images.

Andreas Erdmann, Tim Fühner, Dongbo Xu, 2014, Applied optics.

Challenges and opportunities for process modeling in the nanotechnology era

P. Pichler, A. Burenkov, J. Lorenz, 2014 .

Simulation of mask proximity printing

B. Meliorisz, A. Erdmann, 2007 .

Rigorous simulation and optimization of the lithography/directed self-assembly co-process

Ulrich Welling, Andreas Erdmann, Tim Fühner, 2014, Advanced Lithography.

Advances in lithography: introduction to the feature.

Bruce W. Smith, Bruce Smith, Andreas Erdmann, 2014, Applied optics.

Resist Properties Required for 6.67 nm Extreme Ultraviolet Lithography

T. Kozawa, A. Erdmann, 2012 .

Feasibility Study of Chemically Amplified Resists for Short Wavelength Extreme Ultraviolet Lithography

T. Kozawa, A. Erdmann, 2011 .

Investigation of waveguide modes in EUV mask absorbers

Andreas Erdmann, Peter Evanschitzky, Eelco van Setten, 2021 .

Investigation of waveguide modes in EUV mask absorbers

A. Erdmann, P. Evanschitzky, C. van Lare, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Resonant metamaterials for contrast enhancement in optical lithography.

U. Peschel, P. Banzer, D. Shyroki, 2012, Optics express.

Mask defect detection with hybrid deep learning network

Andreas Erdmann, Peter Evanschitzky, Tilmann Heil, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

Edmund Y. Lam, Andreas Erdmann, Tim Fühner, 2017 .

Modeling of grayscale lithography and calibration with experimental data for blazed gratings

Robert Leitel, Andreas Erdmann, Pankaj Bhardwaj, 2021, Optical Systems Design.

Optical and EUV Lithography: A Modeling Perspective

A. Erdmann, 2021 .

VRP with Pickup and Delivery

Jacques Desrosiers, Marius M. Solomon, Guy Desaulniers, 2000, The Vehicle Routing Problem.

Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?

A. Erdmann, P. Evanschitzky, H. Mesilhy, 2022, Journal of Micro/Nanopatterning, Materials, and Metrology.

Theory of degenerate four-wave mixing an anisotropic, optically active photorefractive crystals

R. Kowarschik, A. Erdmann, 1988 .

Applications of magnetic garnet films in optical communication

A. Erdmann, P. Hertel, Horst Dötsch, 1996 .

Optimization of mask absorber stacks and illumination settings for contact hole imaging

Andreas Erdmann, Peter Evanschitzky, Tim Fühner, 2008, Photomask Japan.

Learned sensing: jointly optimized microscope hardware for accurate image classification.

Pavan Chandra Konda, Roarke Horstmeyer, Andreas Erdmann, 2019, Biomedical optics express.

Association between myelin basic protein expression and left entorhinal cortex pre-alpha cell layer disorganization in schizophrenia

T. Schneider-Axmann, W. Honer, P. Falkai, 2009, Brain Research.

Memetic Algorithms Parametric Optimization for Microlithography

Gabriella Kókai, Bernd Tollkuhn, Andreas Erdmann, 2007 .

Source mask optimization using real-coded genetic algorithms

Sikun Li, Andreas Erdmann, Xiangzhao Wang, 2013, Advanced Lithography.

Innovations in structured thin film design and fabrication for optical applications

Jianda Shao, Zhengxiu Fan, Andreas Erdmann, 2010, International Conference on Thin Film Physics and Applications.

Mask absorber development to enable next-generation EUVL

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2019, Photomask Japan.

3D simulation of light exposure and resist effects in laser direct write lithography

A. Erdmann, T. Onanuga, 2016, 2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).

Simulation of 3D inclined/rotated UV lithography and its application to microneedles

Shijie Liu, A. Erdmann, P. Evanschitzky, 2012 .

Attenuated PSM for EUV: Can they mitigate 3D mask effects?

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2018, Advanced Lithography.

Do we need complex resist models for predictive simulation of lithographic process performance?

Bernd Tollkuhn, Andreas Erdmann, Jeroen Lammers, 2004, SPIE Advanced Lithography.

Genetic Algorithms to Improve Mask and Illumination Geometries in Lithographic Imaging Systems

Gabriella Kókai, Andreas Erdmann, Tim Fühner, 2004, EvoWorkshops.

Genetic Algorithm for Optimization and Calibration in Process Simulation

Andreas Erdmann, Tim Fühner, Jürgen Lorenz, 2004 .

Will Darwin's law help us to improve our resist models?

Bernd Tollkuhn, Andreas Erdmann, Armin Semmler, 2003, SPIE Advanced Lithography.

Simulation of optical lithography

Andreas Erdmann, Wolfgang Henke, A. Erdmann, 1999, Other Conferences.

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

F. Scholze, V. Philipsen, A. Erdmann, 2022, Photomask Technology.

Extreme ultraviolet multilayer defect analysis and geometry reconstruction

Andreas Erdmann, Peter Evanschitzky, Dongbo Xu, 2016 .

Application of the transport of intensity equation to EUV multilayer defect analysis

Andreas Erdmann, Peter Evanschitzky, Dongbo Xu, 2015, Advanced Lithography.

Lithographic importance of base diffusion in chemically amplified photoresists

A. Erdmann, T. Schnattinger, 2009 .

Rigorous mask modeling using waveguide and FDTD methods: an assessment for typical hyper-NA imaging problems

Peter De Bisschop, Andreas Erdmann, Peter Evanschitzky, 2006, Photomask Japan.

Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects (Invited Paper)

Andreas Erdmann, A. Erdmann, 2005, Other Conferences.

Mask and wafer topography effects in immersion lithography

Peter De Bisschop, Andreas Erdmann, Peter Evanschitzky, 2005, SPIE Advanced Lithography.

Simulation of extreme ultraviolet masks with defective multilayers

Andreas Erdmann, Peter Evanschitzky, M. Besacier, 2003, Photomask Japan.

Rigorous simulation of exposure over nonplanar wafers

Takashi Sato, Thomas Schmoeller, Christian K. Kalus, 2003, SPIE Advanced Lithography.

Efficient simulation of light diffraction from three-dimensional EUV masks using field decomposition techniques

Thomas Schmoeller, Christian K. Kalus, Andreas Erdmann, 2003, SPIE Advanced Lithography.

Enhancements in rigorous simulation of light diffraction from phase-shift masks

Nishrin Kachwala, Andreas Erdmann, A. Erdmann, 2002, SPIE Advanced Lithography.

Topography effects and wave aberrations in advanced PSM technology

Andreas Erdmann, A. Erdmann, 2001, SPIE Advanced Lithography.

Comparison of simulation approaches for chemically amplified resists

Andreas Erdmann, Wolfgang Henke, Stewart A. Robertson, 2001, Microelectronic and MEMS Technologies.

Rigorous diffraction analysis for future mask technology

Andreas Erdmann, Christoph Friedrich, C. Friedrich, 2000, Advanced Lithography.

Optimizing edge topography of alternating phase-shift masks using rigorous mask modeling

Ronald L. Gordon, Christian K. Kalus, Andreas Erdmann, 2000, Advanced Lithography.

Modeling of block copolymer dry etching for directed self-assembly lithography

Andreas Erdmann, Zelalem Tamrate Belete, Eberhard Baer, 2018, Advanced Lithography.

Extraordinary low transmission effects for ultra-thin patterned metal films.

U. Peschel, A. Erdmann, F. Shao, 2009, Optics express.

Efficient simulation of EUV pellicles

Andreas Erdmann, Peter Evanschitzky, A. Erdmann, 2017, Photomask Technology.

Advanced EUV mask and imaging modeling

Andreas Erdmann, Peter Evanschitzky, A. Erdmann, 2017 .

Efficient simulation of EUV multilayer defects with rigorous data base approach

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2012, Photomask Technology.

Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2010, European Mask and Lithography Conference.

Benchmark of rigorous methods for electromagnetic field simulations

A. Erdmann, S. Burger, L. Zschiedrich, 2008, Photomask Technology.

Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2008, European Mask and Lithography Conference.

Simulation of larger mask areas using the waveguide method with fast decomposition technique

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2007, SPIE Photomask Technology.

Fast near field simulation of optical and EUV masks using the waveguide method

Andreas Erdmann, Peter Evanschitzky, A. Erdmann, 2007, European Mask and Lithography Conference.

Influence of two typical defects on the near-field optical properties of multilayer dielectric compression gratings.

Fanyu Kong, Shijie Liu, J. Shao, 2012, Applied optics.

Influence of geometry variations and defects on the near-field optical properties of pulsed compression gratings

Shijie Liu, Jianda Shao, Kui Yi, 2011, Optical Systems Design.

Characterization of the scattering effect of complex mask geometries with surface roughness

Andreas Erdmann, Christoph Pflaum, Zhabiz Rahimi, 2010, Photonics Europe.

Application of artificial neural networks to compact mask models in optical lithography simulation

Andreas Erdmann, Peter Evanschitzky, Viviana Agudelo, 2013 .

Rigorous simulation of alignment for microlithography

Andreas Erdmann, Nikolay I. Nikolaev, A. Erdmann, 2003 .

An integrated source/mask/DSA optimization approach

Ulrich Welling, Andreas Erdmann, Tim Fühner, 2016, Advanced Lithography.

Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes

Andreas Erdmann, Peter Evanschitzky, Jürgen Lorenz, 2011, Photomask Technology.

Rigorous electromagnetic field simulation of the impact of photomask line-edge and line-width roughness on lithographic processes

Andreas Erdmann, Peter Evanschitzky, J. Lorenz, 2012 .

Study of novel EUVL mask absorber candidates

Patrick Jaenen, Vicky Philipsen, Victor Soltwisch, 2021 .

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2017 .

Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography

Xiaolei Liu, Sikun Li, Andreas Erdmann, 2014 .

Analytical model for EUV mask diffraction field calculation

Andreas Erdmann, Xiangzhao Wang, Peng Bu, 2011, Optical Systems Design.

Direct optimization approach for lithographic process conditions

Andreas Erdmann, Sebastian Seifert, Tim Fühner, 2007 .

Adaptive denoising method to improve aberration measurement performance

Sikun Li, Anatoly Bourov, Andreas Erdmann, 2013 .

Toward automatic mask and source optimization for optical lithography

Andreas Erdmann, Bernd Tollkuehn, Tim Fuehner, 2004, SPIE Advanced Lithography.

Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2013 .

Fourier ptychography for lithography high NA systems

Yasin Ekinci, Peter Evanschitzky, Atoosa Dejkameh, 2018, Optical Systems Design.

3D mask effects in high NA EUV imaging

Timon Fliervoet, Andreas Erdmann, Peter Evanschitzky, 2019, Advanced Lithography.

Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography

Xiaolei Liu, Sikun Li, Andreas Erdmann, 2014, Advanced Lithography.

Accurate prediction of EUV lithographic images and 3D mask effects using generative networks

Andreas Erdmann, Peter Evanschitzky, Andreas Rosskopf, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

A simulation study on the impact of lithographic process variations on CMOS device performance

Ina Kodrasi, Andreas Erdmann, Tim Fühner, 2008, SPIE Advanced Lithography.

Heterodyne Interferometer with Photorefractive BGO Crystals

R. Kowarschik, A. Erdmann, Gustavo Rodrigues Zurita, 1991 .

Lithographic process window optimization for mask aligner proximity lithography

Reinhard Voelkel, Andreas Erdmann, Juergen Brugger, 2014, Advanced Lithography.

Lithography simulation: modeling techniques and selected applications

Feng Shao, Andreas Erdmann, Peter Evanschitzky, 2009, Optical Metrology.

Modeling of Near-and Far-Field Diffraction from EUV Absorbers Using Physics-Informed Neural Networks

V. Medvedev, A. Erdmann, A. Rosskopf, 2023, 2023 Photonics & Electromagnetics Research Symposium (PIERS).

A model of self-limiting residual acid diffusion for pattern doubling

Andreas Erdmann, Charles R. Szmanda, André Fiebach, 2009 .