Kane Jen

Double Exposure Materials: Simulation Study of Feasibility

N. Turro, C. Willson, J. Byers, 2007 .

Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography

Ryan Deschner, C. Grant Willson, Satoshi Takei, 2010 .

An analysis of double exposure lithography options

Bryan J. Rice, Paul Zimmerman, C. Grant Willson, 2008, SPIE Advanced Lithography.

Materials modeling and development for use in double-exposure lithography applications

C. Grant Willson, Saul Lee, Kane Jen, 2009 .