M. Torkler

发表

Modeling of edge roughness in ion projection lithography

W. Henke, M. Torkler, 1999 .

Fabrication of 3.5 GHz surface acoustic wave filters by ion projection lithography

M. Kreutzer, G. Zwicker, M. Torkler, 1992 .

Ion projection lithography for resistless patterning of thin magnetic films

H. Rothuizen, P. Vettiger, B. Terris, 2000 .

Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices

Ivo W. Rangelow, Ka-Ngo Leung, Hans Loschner, 1999 .

Resolution improvement of ion projector with a low energy spread multicusp ion source

Hans Loeschner, Ivo W. Rangelow, Ka-Ngo Leung, 1999 .

DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing

I. Rangelow, I. Kostic, P. Hudek, 1998 .

Chemically amplified deep ultraviolet resist for positive tone ion exposure

M. Torkler, W. H. Bruenger, M. Torkler, 1997 .

Stability and electronic adjustment of ion images projected at 10×reduction

M. Torkler, W. Brünger, L. Buchmann, 1992 .

Nanocomposite resist systems for next generation lithography

Wei He, Marie Angelopoulos, Wu-Song Huang, 2002 .

Measuring acid generation efficiency in chemically amplified resists with all three beams

Hans Loeschner, Robert L. Brainard, Rainer Kaesmaier, 1999 .

Experimental investigation of stochastic space charge effects on pattern resolution in ion projection lithography systems

I. Berry, R. Fischer, M. Torkler, 1994 .