J. Kitano

Resolution–linewidth roughness–sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist

Joshua S. Hooge, A. V. Pret, B. Rathsack, 2011 .

EUV RLS performance tradeoffs for a polymer bound PAG resist

Alessandro Vaglio Pret, Roel Gronheid, Kathleen Nafus, 2010, Advanced Lithography.

Molecular contamination control technologies for high NA 193nm lithography

Nobuhiro Takahashi, Junichi Kitano, Masaharu Shioguchi, 2006, SPIE Advanced Lithography.

Further investigation of EUV process sensitivities for wafer track processing

E. Hendrickx, J. Kitano, K. Nafus, 2010, Advanced Lithography.

Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials

Roel Gronheid, Junichi Kitano, Steven Scheer, 2008, SPIE Advanced Lithography.

193nm immersion process defect generation and reduction mechanism investigation using analytical methods

Satoru Shimura, Hideharu Kyoda, Tetsu Kawasaki, 2006, SPIE Advanced Lithography.