A. Bramati

Mask aligner lithography simulation - From lithography simulation to process validation

U. Hofmann, P. Hudek, M. Hornung, 2012 .

Lightfields behind amplitude masks: Creating phase discontinuities

H. Herzig, W. Noell, U. Vogler, 2016, 2016 15th Workshop on Information Optics (WIO).

Lightfields behind amplitude and phase masks applications in high resolution proximity lithography

H. Herzig, U. Vogler, Myun-Sik Kim, 2015, 2015 14th Workshop on Information Optics (WIO).

Advanced Mask Aligner Lithography (AMALITH)

Reinhard Voelkel, Uwe Vogler, Arianna Bramati, 2012, Advanced Lithography.

Lithographic process window optimization for mask aligner proximity lithography

Reinhard Voelkel, Andreas Erdmann, Juergen Brugger, 2014, Advanced Lithography.