Chas Archie

发表

CDSEM focus/dose monitor for product applications

Timothy A. Brunner, Ofer Adan, Eric P. Solecky, 2010, Advanced Lithography.

Spatial signature in local overlay measurements: what CD-SEM can tell us and optical measurements can not

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2010, Advanced Lithography.

The measurement uncertainty challenge of advanced patterning development

Chas Archie, Narender Rana, Wei Lu, 2009, Advanced Lithography.

Concerning the influence of pattern symmetry on CD-SEM local overlay measurements for double patterning of complex shapes

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2010, Advanced Lithography.

Hybrid reference metrology exploiting patterning simulation

Chas Archie, Narender Rana, 2010, Advanced Lithography.

Performance of the IBM synchrotron X-ray source for lithography

Chas Archie, C. Archie, 1993, IBM J. Res. Dev..

Impact of shrinking measurement error budgets on qualification metrology sampling and cost

Masafumi Asano, Alok Vaid, Chas Archie, 2014, Advanced Lithography.

Characterization of capacitive 3D deep trench mask open structures using scatterometry

Matthew Sendelbach, Chas Archie, Pedro Herrera, 2007, SPIE Advanced Lithography.

Effect of measurement error budgets and hybrid metrology on qualification metrology sampling

Masafumi Asano, Chas Archie, Carmen Osorio, 2014 .

Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes

Scott Halle, Takumichi Sutani, Atsuko Yamaguchi, 2011 .

Realizing value-added metrology

Bryan J. Rice, Pete Lipscomb, Dilip Patel, 2007, SPIE Advanced Lithography.

A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM

Peter Ebersbach, Alok Vaid, Cornel Bozdog, 2011, Advanced Lithography.

Impact of sampling on uncertainty: semiconductor dimensional metrology applications

Masafumi Asano, Benjamin Bunday, Ingrid B. Peterson, 2008, SPIE Advanced Lithography.

New comprehensive metrics and methodology for metrology tool fleet matching

Eric P. Solecky, Chas Archie, Bill Banke, 2005, SPIE Advanced Lithography.

Monitoring measurement tools: new methods for driving continuous improvements in fleet measurement uncertainty

Carsten Hartig, Alok Vaid, Bernd Schulz, 2009, Advanced Lithography.

Metrology tool fleet management: applying FMP tool matching and monitoring concepts to an overlay fleet

Eric P. Solecky, Chas Archie, Bill Banke, 2006, SPIE Advanced Lithography.

Embedded charge investigation: industry concerns and metrology solutions

Ofer Adan, Roger Cornell, Paul Llanos, 2006, SPIE Advanced Lithography.