Chen Li

发表

Atomic Layer Etching at the Tipping Point: An Overview

G. Oehrlein, D. Metzler, Chen Li, 2015 .

Influence of voltage on photo-electrochemical etching of n-type macroporous silicon arrays

Wang Yang, Chen Li, W. Guozheng, 2010 .

Impact of rough substrates on hydrogen-doped indium oxides for the application in CIGS devices

R. Klenk, Jiro Nishinaga, H. Shibata, 2020 .

Investigation of thin oxide layer removal from Si substrates using an SiO2 atomic layer etching approach: the importance of the reactivity of the substrate

G. Oehrlein, D. Metzler, Chen Li, 2017 .

Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

Robert L. Bruce, Sebastian Engelmann, Eric A. Joseph, 2016 .

Impact of hydrofluorocarbon molecular structure parameters on plasma etching of ultra-low-K dielectric

G. Oehrlein, Chen Li, Rahul Gupta, 2016 .

Plasma modification of polypropylene surfaces and its alloying with styrene in situ

J. Sheng, G. Ma, Ding-hai Huang, 2012 .

Dry Etching Characteristics of Zinc Oxide Thin Films in Cl 2 -Based Plasma

Chang-I. Kim, J. Park, J. Woo, 2011 .

Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition

E. Joseph, S. Engelmann, R. Bruce, 2020 .

Etching of Si3N4 induced by electron beam plasma from hollow cathode plasma in a downstream reactive environment

V. Godyak, G. Oehrlein, K. Edinger, 2020 .

Electron beam injection from a hollow cathode plasma into a downstream reactive environment: Characterization of secondary plasma production and Si3N4 and Si etching

V. Godyak, G. Oehrlein, K. Edinger, 2020 .

Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors

E. Joseph, S. Engelmann, R. Bruce, 2018, Journal of Vacuum Science & Technology A.

Damage on the Surface of Zinc Oxide Thin Films Etched in Cl-based Gas Chemistry

Chang-I. Kim, J. Woo, Chen Li, 2011 .

Study on Properties of Silicon Oxycarbide Thin Films Prepared by RF Magnetron Sputtering

Chen Li, Ling Zhang, Tao Chen, 2012, EMEIT 2012.

Metal/polymer interface adhesion by partially ionized beam deposition

P. K. Wu, J. McDonald, T. Lu, 1996 .

Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4

G. Oehrlein, D. Metzler, Chen Li, 2016 .

Effect of the chamber wall on fluorocarbon-assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

G. Oehrlein, D. Metzler, Chen Li, 2016 .

Application of cyclic fluorocarbon/argon discharges to device patterning

E. Joseph, Yu Zhu, S. Engelmann, 2016 .

The Etching Characteristics of the TaN Thin Films Using Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Chen Li, 2013 .