M. Kawakami

Effect of the chamber wall on fluorocarbon-assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma.

Chen Li, G. Oehrlein, D. Metzler, 2014, Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society.

Laser-assisted pulsed plasma thruster for space propulsion applications

M. Kawakami, H. Horisawa, I. Kimura, 2005 .

Effect of the chamber wall on fluorocarbon-assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

G. Oehrlein, D. Metzler, Chen Li, 2016 .