A. Paterson

发表

Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions

S. Sriraman, M. Kushner, Chad Huard, 2017 .

Enhanced etch process for TSV & deep silicon etch

Russell Dover, A. Eppler, A. Paterson, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Electric fields in the sheath formed in a 300 mm, dual frequency capacitive argon discharge

E. Barnat, A. Paterson, G. Hebner, 2007 .

Ion temperature and velocity in a 300 mm diameter capacitively coupled plasma reactor driven at 13, 60 and 162 MHz

A. Paterson, G. Hebner, A. M. Paterson, 2010 .

Investigation of feature orientation and consequences of ion tilting during plasma etching with a three-dimensional feature profile simulator

S. Sriraman, M. Kushner, Yiting Zhang, 2017 .

Three-Dimensional Measurements of Fundamental Plasma Parameters in Pulsed ICP Operation

W. Gekelman, P. Pribyl, A. Paterson, 2020, 2020 IEEE International Conference on Plasma Science (ICOPS).

Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features

S. Sriraman, M. Kushner, Yiting Zhang, 2017 .

Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas

S. Sriraman, M. Kushner, A. Paterson, 2018, Journal of Vacuum Science & Technology A.

Control of ion energy and angular distributions in dual-frequency capacitively coupled plasmas through power ratios and phase: Consequences on etch profiles

S. Sriraman, M. Kushner, Yiting Zhang, 2015 .

Three-dimensional measurements of plasma parameters in an inductively coupled plasma processing chamber

W. Gekelman, M. Kushner, P. Pribyl, 2019, Physics of Plasmas.

Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber

E. Barnat, A. Paterson, G. Hebner, 2006 .

Spatial and frequency dependence of plasma currents in a 300 mm capacitively coupled plasma reactor

E. Barnat, A. Paterson, G. Hebner, 2006 .

Measured radial dependence of the peak sheath voltages present in very high frequency capacitive discharges

E. Barnat, A. Paterson, G. Hebner, 2007 .

The impact of frequency mixing on sheath properties: Ion energy distribution and Vdc∕Vrf interaction

A. Paterson, D. Hoffman, S. Shannon, 2005 .

Characterization of the NiFe sputter etch process in a rf plasma

A. Paterson, J. Holland, T. Kropewnicki, 2006 .

Superbend project at the Advanced Light Source

J. Chen, M. Fahmie, F. Ottens, 2001, PACS2001. Proceedings of the 2001 Particle Accelerator Conference (Cat. No.01CH37268).