Chie Shishido

发表

Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography

Norio Hasegawa, David Laidler, Shaunee Cheng, 2008, SPIE Advanced Lithography.

Image resolution monitoring technique for CD-SEM

Hiroki Kawada, Robert Steffen, Chie Shishido, 2006, SPIE Advanced Lithography.

Robust Pattern Registration Method using Plural Evaluation Functions for LSI Patterns

Masahiro Watanabe, Maki Tanaka, Chie Shishido, 2004 .

Verification and extension of the MBL technique for photo resist pattern shape measurement

Norio Hasegawa, Peter De Bisschop, David Laidler, 2011, Advanced Lithography.

CD-bias evaluation and reduction in CD-SEM linewidth measurements

Kenji Watanabe, Maki Tanaka, Chie Shishido, 2007, SPIE Advanced Lithography.

High-precision CD matching monitoring technology using profile gradient method for the 32-nm technology generation

Tatsuya Maeda, Mayuka Osaki, Chie Shishido, 2009, Advanced Lithography.

Study on fabrication process parameter estimation by visual measurement

Yuji Takagi, Maki Tanaka, Chie Shishido, 2009 .

Characterizing cross-sectional profile variations by using multiple parameters extracted from top-down SEM images

Yuji Takagi, Maki Tanaka, Chie Shishido, 2002, SPIE Advanced Lithography.

Application of model-based library approach to Si3N4 hardmask measurements

Kenji Watanabe, Maki Tanaka, Chie Shishido, 2008, SPIE Advanced Lithography.

Pattern alignment method based on consistency among local registration candidates for LSI wafer pattern inspection

Masahiro Watanabe, Chie Shishido, Takashi Hiroi, 2002, Sixth IEEE Workshop on Applications of Computer Vision, 2002. (WACV 2002). Proceedings..

Cross-sectional gate feature identification method using top-down SEM images

Yuji Takagi, Maki Tanaka, Chie Shishido, 2003, SPIE Advanced Lithography.

Dose and focus estimation using top-down SEM images

Yuji Takagi, Maki Tanaka, Chie Shishido, 2003, SPIE Advanced Lithography.

Influence of electron incident angle distribution on CD-SEM linewidth measurements

Hiroki Kawada, Maki Tanaka, Chie Shishido, 2006, SPIE Advanced Lithography.

CD-bias reduction in CD-SEM line-width measurement for the 32-nm node and beyond using the model-based library method

Maki Tanaka, Mayuka Osaki, Chie Shishido, 2009, Advanced Lithography.

Improved secondary electron extraction efficiency model for accurate measurement of narrow-space patterns using model-based library matching

Maki Tanaka, Chie Shishido, Akira Hamamatsu, 2011, Advanced Lithography.

CD bias reduction in CD-SEM linewidth measurements for advanced lithography

Peter Vanoppen, Kenji Watanabe, Maki Tanaka, 2008, SPIE Advanced Lithography.

Application of model-based library approach to photoresist pattern shape measurement in advanced lithography

Norio Hasegawa, Shaunee Cheng, Maki Tanaka, 2010, Advanced Lithography.

Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography

David Laidler, Shaunee Cheng, Monique Ercken, 2009, Advanced Lithography.

CD bias reduction in CD-SEM of very small line patterns: sidewall shape measurement using model-based library matching method

Maki Tanaka, Mayuka Osaki, Chie Shishido, 2010, Advanced Lithography.

MPPC technique for gate etch process monitoring using CD-SEM images and its validity verification

Yuji Takagi, Maki Tanaka, Chie Shishido, 2004, SPIE Advanced Lithography.

Monitoring of Photoresist Pattern Thickness Using Top-down SEM Image

Yuji Takagi, Atsushi Miyamoto, Chie Shishido, 2007 .

Accurate measurement of very small line patterns in critical dimension scanning electron microscopy using model-based library matching technique

Maki Tanaka, Mayuka Osaki, Chie Shishido, 2011 .