Kazuto Matsuki

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Hiroaki Suzuki, Yoshio Suzuki, Ryoichi Hirano, 1999, Photomask and Next Generation Lithography Mask Technology.

Automatic photomask defect classification method

Kyoji Yamashita, Kazuto Matsuki, Kiminobu Akeno, 1996, Photomask and Next Generation Lithography Mask Technology.

Performance improvement in electron-beam reticle writing system

Ryoichi Hirano, Hirohito Anze, Yoji Ogawa, 1995, Photomask and Next Generation Lithography Mask Technology.

Reticle flexure influence on pattern positioning accuracy for reticle writing

Ryoichi Hirano, Yoshihiko Takahashi, Toru Tojo, 1995, Photomask and Next Generation Lithography Mask Technology.

Analysis of pattern shift error for mask clamping measured by Nikon XY-31

Ryoichi Hirano, Toru Tojo, Yoji Ogawa, 1995, Photomask and Next Generation Lithography Mask Technology.

Pattern shift error induced by coating and developing

Ryoichi Hirano, Toru Tojo, Shusuke Yoshitake, 1996, Photomask and Next Generation Lithography Mask Technology.

Advanced mask inspection optical system (AMOS) using 198.5-nm wavelength for 65-nm (hp) node and beyond: system development and initial state D/D inspection performance

Nobuyuki Yoshioka, Ikunao Isomura, Takeshi Nishizaka, 2004, SPIE Photomask Technology.