Kiyomi Koyama

发表

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Hiroaki Suzuki, Yoshio Suzuki, Ryoichi Hirano, 1999, Photomask and Next Generation Lithography Mask Technology.

Shape Data Operations for VSB EB Data Conversion Using CAD Tools : Lithography Technology

Kiyomi Koyama, Susumu Watanabe, Osamu Ikenaga, 1989 .

Shape Data Operations for VSB LB Data Conversion Using CAD Tools

Shinji Sakamoto, Kiyomi Koyama, Susumu Watanabe, 1989 .

High-Speed Electron Beam Data Conversion System Combining Hierarchical Operation with Parallel Processing

Shunko Magoshi, Kiyomi Koyama, Susumu Watanabe, 1992 .

Microprogram control of a Prolog machine

Kiyomi Koyama, 1986, SIGM.

Computer Aided Design Software for Designing Phase-Shifting Masks

Shigehiro Hara, Kiyomi Koyama, Kazuko Ooi, 1993 .

Method of Designing Phase-Shifting Masks Utilizing a Compactor

Kiyomi Koyama, Kazuko Ooi, Masakazu Kiryu, 1994 .

Character Projection EB Data Conversion System Combined with Throughput Analyzer

Shunko Magoshi, Shigehiro Hara, Kiyomi Koyama, 1994 .

Large-Area Optical Proximity Correction with a Combination of Rule-Based and Simulation-Based Methods

Kiyomi Koyama, Sachiko Miyama, Kazuko Yamamoto, 1996 .

Enhancing a hierarchical, parallel electron beam data conversion processor toward 1 Gbit memory lithography

Shunko Magoshi, Shigehiro Hara, Kiyomi Koyama, 1995 .

A high accuracy and high throughput electron beam reticle writing system for 16M dynamic random access memory class and beyond devices

Osamu Ikenaga, Fumiaki Shigemitsu, Hirohito Anze, 1990 .