A. Su

Batch Sequencing for Run-to-Run Control: Application to Chemical Mechanical Polishing

Cheng-Ching Yu, S. Shen, Yih-Hang Chen, 2005 .

Planarization Strategy of Cu CMP Interaction between Plated Copper Thickness and Removal Rate

Cheng-Ching Yu, J. Chiu, S. Shen, 2004 .

Control relevant issues in semiconductor manufacturing : Overview with some new results

Cheng-Ching Yu, Ching-Kong Chao, Hsiao-Ping Huang, 2007 .