Hunyoung Bark

发表

Wafer-scale monolayer MoS2 grown by chemical vapor deposition using a reaction of MoO3 and H2S

G. Ryu, Changgu Lee, Z. Lee, 2016, Journal of physics. Condensed matter : an Institute of Physics journal.

Synthesis of wafer-scale uniform molybdenum disulfide films with control over the layer number using a gas phase sulfur precursor.

Il-Kwon Oh, Jong-Hyun Ahn, Gyeong Hee Ryu, 2014, Nanoscale.

Large-area niobium disulfide thin films as transparent electrodes for devices based on two-dimensional materials.

Changgu Lee, Jinhwan Lee, J. Cho, 2018, Nanoscale.

Mechanical characterization of phase-changed single-layer MoS2 sheets

D. Byun, Changgu Lee, Dae-Hyun Cho, 2019, 2D Materials.

Structural and Optical Properties of Single- and Few-Layer Magnetic Semiconductor CrPS4.

Changgu Lee, Jinhwan Lee, Z. Lee, 2017, ACS nano.

Low‐Temperature Synthesis of Large‐Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma‐Enhanced Chemical Vapor Deposition

Taesung Kim, Geun Young Yeom, Gyeong Hee Ryu, 2015, Advanced materials.

Field-effect transistor with a chemically synthesized MoS2 sensing channel for label-free and highly sensitive electrical detection of DNA hybridization

Nae-Eung Lee, Bo-Yeong Kim, Taehyeong Kim, 2015, Nano Research.

Ultrafast and low-temperature synthesis of patternable MoS2 using laser irradiation

Changgu Lee, Jinhwan Lee, Youngchan Kim, 2019, Journal of Physics D: Applied Physics.

Wafer-Scale Substitutional Doping of Monolayer MoS2 Films for High-Performance Optoelectronic Devices.

Changgu Lee, B. Kang, Youngchan Kim, 2019, ACS applied materials & interfaces.

Bias-assisted atomic force microscope nanolithography on NbS2 thin films grown by chemical vapor deposition

Changgu Lee, Sang-Hyun Kwon, Hunyoung Bark, 2016 .

Wafer-scale and patternable synthesis of NbS2 for electrodes of organic transistors and logic gates

Sungjoo Lee, Changgu Lee, J. Cho, 2019, Journal of Materials Chemistry C.

Synthesis of wafer-scale uniform molybdenum disulfide films with control over the layer number using a gas phase sulfur precursor.

G. Ryu, Youngbin Lee, Changgu Lee, 2014, Nanoscale.