Atsushi Nakamura

发表

Double Patterning Materials for Sub-40nm Application

T. Shimokawa, Akimasa Soyano, Yoshikazu Yamaguchi, 2008 .

True-color 640 ppi OLED arrays patterned by CA i-line photolithography

P. Heremans, S. Steudel, D. Janssen, 2015 .

Direct laser writing defects in holographic lithography-created photonic lattices.

Satoru Shoji, Satoshi Kawata, Hong-Bo Sun, 2005, Optics letters.

High-refractive-index fluids for the next-generation ArF immersion lithography

Yong Wang, Shiro Kusumoto, Motoyuki Shima, 2006, SPIE Advanced Lithography.

Preparation of Organic-Inorganic Hybrids by Cationic Photopolymerization of Fluorene Diglycidyl Ether

Atsushi Nakamura, K. Matsukawa, N. Nishioka, 2006 .

Preparation of Titania/Acrylate Hybrid Thin Films and Properties Their Refractive Indices

Atsushi Nakamura, H. Murase, K. Matsukawa, 2007 .

Sub-40-nm half-pitch double patterning with resist freezing process

Takayoshi Abe, Shiro Kusumoto, Yoshikazu Yamaguchi, 2008, SPIE Advanced Lithography.

Demonstration of a novel low cost single material temporary bond solution for high topography substrates based on a mechanical wafer debonding and innovative adhesive removal

A. Jourdain, G. Beyer, E. Beyne, 2015, 2015 IEEE 65th Electronic Components and Technology Conference (ECTC).

Detection of Small Particles on TFT-LCD Using Comparison Method along Scanning Direction of Image Sensor.

Toshiaki Yachi, Nobuyuki Akiyama, Shuichi Chikamatsu, 1995 .

High resolution photolithography for direct view active matrix organic light‐emitting diode augmented reality displays

Tung Huei Ke, Soeren Steudel, Gerwin H. Gelinck, 2018 .

Photolithographic patterning of organic photodetectors with a non-fluorinated photoresist system

Soeren Steudel, Paul Heremans, Ichiro Koyama, 2014 .

Effect of integrated protection layer on photolithographic patterned organic light emitting diodes

P. Heremans, S. Steudel, D. Janssen, 2016 .