H. Sewell

The Good Language Learner

N. Naiman, H. Sewell, Haifa Alroqi, 2003 .

Imaging of 32-nm 1:1 lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a k[sub 1] of 0.25

Roger H. French, Harry Sewell, Louis Markoya, 2005 .

200nm deep-UV lithography using step-and-scan

H. Sewell, 1997 .

Mixing and Matching Deep-UV Step-and-Scan with I-Line Step and Repeat

H. Sewell, 1995 .

The next phase for immersion lithography

Jan Mulkens, Bob Streefkerk, Paul Gräupner, 2006, SPIE Advanced Lithography.

Status and critical challenges for 157-nm lithography

R. Watso, U. Okoroanyanwu, A. Goethals, 2004 .

High-Resolution Imagery: The Matching Of Optical And Resist Systems In The Mid-UV

H. Sewell, I. Friedman, H. Sewell, 1988, Advanced Lithography.

Slow states in InSb/SiOx thin film transistors

J. Anderson, H. Sewell, 1975 .