Keigo Koida

Protection and reduction of surface oxidation of Mo∕Si multilayers for extreme ultraviolet lithography projection optics by control of hydrocarbon gas atmosphere

M. Niibe, Keigo Koida, Y. Kakutani, 2008 .

In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination

Masahito Niibe, Katsuhiko Murakami, Takashi Aoki, 2007 .

Study on contamination of projection optics surface for extreme ultraviolet lithography

Masahito Niibe, Keigo Koida, M. Niibe, 2009 .

Inhibition of carbon growth and removal of carbon deposits on extreme ultraviolet lithography mirrors by extreme ultraviolet irradiation in the presence of water, oxygen, or oxygen/ozone mixtures

M. Niibe, Keigo Koida, Y. Kakutani, 2011 .