Allan L. Sagle

Exploring the fundamental limit of CD control: a model for shot noise in lithography

Ming L. Yu, Allan L. Sagle, Benny Buller, 2005, SPIE Advanced Lithography.

System architecture choices for an advanced mask writer (100 to 130 nm)

Frank E. Abboud, Sergey Babin, David Trost, 1999, Photomask Technology.

Design considerations for an electron-beam pattern generator for the 130-nm generation of masks

Frank E. Abboud, Sergey Babin, Charles A. Sauer, 1999, Photomask and Next Generation Lithography Mask Technology.

0.25-μm lithography using a 50-kV shaped electron-beam vector scan system

Allan L. Sagle, Mark A. Gesley, Zoilo C. H. Tan, 1995, Advanced Lithography.

Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness

Ming L. Yu, Allan L. Sagle, Benny Buller, 2005, Photomask Japan.

Raster Shaped Beam Pattern Generation for 70 nm Photomask Production

Frank E. Abboud, Allan L. Sagle, Sriram Krishnaswami, 2002, Photomask Technology.

Exploring the fundamental limit of CD control: a measurement of shot noise induced CDU in e-beam lithography

Ming L. Yu, Allan L. Sagle, Benny Buller, 2005, Other Conferences.

Multisource optimization of a column for electron lithography

Paul C. Allen, Allan L. Sagle, Marian Mankos, 2000 .

Raster shaped beam pattern generation

Volker Boegli, Allan L. Sagle, Stephen A. Rishton, 1999 .