Woo-Sung Han

发表

Prediction of MEEF using a simple model and MEEF enhancement parameters

Dong-Hoon Chung, Seung-Hune Yang, Hyung-Do Kim, 2001, Photomask Japan.

Analysis of dry etch loading effect in mask fabrication

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2002, SPIE Photomask Technology.

Analysis of photomask distortion caused by blank materials and open ratios

Woo-Sung Han, Jung-Min Sohn, Sung-Woon Choi, 2001, SPIE Photomask Technology.

Evaluations of optical performance for micro-trench on quartz etch in ArF lithography

Seong-Woon Choi, Woo-Sung Han, Hyuk-Joo Kwon, 2005, Photomask Japan.

What an antishrinkage coating method can surmount among stumbling block of ArF resists

Jung-Hyeon Lee, Han-Ku Cho, Joo-Tae Moon, 2003, SPIE Advanced Lithography.

Mask fabrication results using new laser writing system: Sigma7300

Seong-Woon Choi, Woo-Sung Han, Junghoon Lee, 2006, Photomask Japan.

Optimized distributed computing environment for mask data preparation

Seong-Woon Choi, Woo-Sung Han, Yo-Han Choi, 2005, SPIE Photomask Technology.

Optical performance enhancement technique for 45-nm-node with binary mask

Woo-Sung Han, Sung-Woon Choi, Hee-Bom Kim, 2007, SPIE Advanced Lithography.

Measurement of the flare and in-field linewidth variation due to the flare

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2002, SPIE Advanced Lithography.

Most feasible curing process for ArF resists in device integration aspect

Han-Ku Cho, Woo-Sung Han, Yool Kang, 2003, SPIE Advanced Lithography.

Assessments on process parameters' influences to the proximity correction

Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, 2004, SPIE Advanced Lithography.

Extended capability of laser writer for masks beyond 180-nm nodes

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2002, SPIE Photomask Technology.

Comparative study on MEEF and dose latitude between attenuated PSM and Cr binary masks

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2000, Photomask Japan.

The impact of total measurement uncertainty (TMU) on overlay error correction

Woo-Sung Han, Young-Seog Kang, Jangho Shin, 2010, Advanced Lithography.

Evaluation of ArF CLM in the sub-100-nm DRAM cell

Han-Ku Cho, Dong-Hoon Chung, Woo-Sung Han, 2003, SPIE Advanced Lithography.

Pellicle process effects in critical dimension fluctuation

Woo-Sung Han, Byung-Cheol Cha, Yong-Hoon Kim, 2004, SPIE Advanced Lithography.

Comprehensive analysis of sources of total CD variation in ArF resist perspective

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.

Successful application of angular scatterometry to process control in sub-100-nm DRAM device

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Image simulation in immersion lithography using Debye integral and scattering matrix method

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.

Required mask specification for mass production devices below 65-nm design node

Seong-Woon Choi, Woo-Sung Han, Soo-Han Choi, 2006, SPIE Photomask Technology.

AF fixer: new incremental OPC method for optimizing assist feature

Joo-Tae Moon, Woo-Sung Han, Sung-Woon Choi, 2008, Photomask Japan.

The study on causes and control methods of haze contamination

Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, 2005, SPIE/COS Photonics Asia.

Influence of intermetal dielectric thickness on overlay mark size variation in photolithography

Woo-Sung Han, U-In Chung, Young-Chang Kim, 2000, Advanced Lithography.

Swing curve characteristics of halftone PSM with off-axis illumination for i-line lithography

Woo-Sung Han, Yong-Seok Choi, Hoyoung Kang, 1996, Advanced Lithography.

Circuit design: emphasis on mask design and specification

Woo-Sung Han, Hoyoung Kang, Young-Bum Koh, 1994, Photomask Technology.

Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

Gi-Sung Yeo, Han-Ku Cho, Joo-Tae Moon, 2003, SPIE Advanced Lithography.

Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Han-Ku Cho, Woo-Sung Han, Chan Hwang, 2004, SPIE Advanced Lithography.

Effectiveness and confirmation of local area flare measurement method in various pattern layouts

Joo-Tae Moon, Woo-Sung Han, Dongseok Nam, 2002, SPIE Advanced Lithography.

The specification of the 45-nm node photomask repair process

Sungmin Huh, Woo-Sung Han, Sung-Woon Choi, 2006, SPIE Photomask Technology.

Side-lobe suppression in halftone PSM with optical proximity correction

In-Gyun Shin, Woo-Sung Han, Sang-Gyun Woo, 1995, Photomask Technology.

Vacuum delay effect of CAR in mask fabrication

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2001, SPIE Advanced Lithography.

The application of phase grating to CLM technology for the sub-65nm node optical lithography

Woo-Sung Han, Sung-Woon Choi, Chan-Uk Jeon, 2005, Photomask Japan.

Optical performances under the conditions of various geometrical structures and phase defects in phase edge PSM

Dong-Hoon Chung, In-Gyun Shin, Seong-Woon Choi, 2002, SPIE Photomask Technology.

Advanced module-based approach to effective CD prediction of sub-100nm patterns

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Method for prevention of unopened contact hole in dual-damascene process

Woo-Sung Han, Chang-Hwan Kim, Jeong-Woo Lee, 2001, SPIE Advanced Lithography.

High Performance Lithography with Advanced Modified Illumination (Special Issue on Quarter Micron Si Device and Process Technologies)

Woo-Sung Han, Cheol-Hong Kim, Hoyoung Kang, 1994 .

Improvement of pattern collapse in sub-100 nm nodes

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2003, SPIE Advanced Lithography.

Photomask dry-etching techniques for hard mask

Woo-Sung Han, Hyuk-Joo Kwon, Sung-Won Kwon, 2006, Photomask Japan.

Virtual OPC at hyper NA lithography

Woo-Sung Han, Sung-Woon Choi, Yong-Jin Chun, 2007, SPIE Advanced Lithography.

Simulation of resist heating effect with e-beam lithography using distributed processing (DP)

Woo-Sung Han, Won-Tai Ki, Byung-Sup Ahn, 2005, Photomask Japan.

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Seong-Woon Choi, Woo-Sung Han, George G. Barclay, 2009, Advanced Lithography.

Analysis of mask CD error by dose modulation for fogging effect

Seung-Hune Yang, Woo-Sung Han, Sung-Woon Choi, 2004, Photomask Japan.

How large MEEF is acceptable for the low-k1 lithography?

Seong-Woon Choi, Woo-Sung Han, Seong-Yong Moon, 2005, SPIE Photomask Technology.

Characteristics of standing-wave effect of off-axis illumination depending on two different resist systems and the polarization effect of stepper

Woo-Sung Han, Keeho Kim, Chul Hong Kim, 1994, Advanced Lithography.

Fidelity comparison of island patterns with different types of illuminations and phase shift masks

Woo-Sung Han, Sang-Gyun Woo, Seong-Yong Moon, 1995, Advanced Lithography.

Qualitative analysis of haze defects

Seong-Woon Choi, Woo-Sung Han, Jaehyuck Choi, 2006, SPIE Photomask Technology.

Impact of illumination intensity profile on lithography simulation

Insung Kim, Han-Ku Cho, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Layer-specific illumination optimization by Monte Carlo method

Han-Ku Cho, Woo-Sung Han, Chan Hwang, 2003, SPIE Advanced Lithography.

Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing

Woo-Sung Han, Sung-Woon Choi, Seong-Yong Moon, 2005, Photomask Japan.

Strategy for sub-80-nm contact hole patterning considering device fabrication

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.

Modified procedure for evaluation of low-k1 process windows

Han-Ku Cho, Woo-Sung Han, Sang-Gyun Woo, 2004, SPIE Advanced Lithography.

Phase-shifted assist feature OPC for sub-45-nm node optical lithography

Seong-Woon Choi, Woo-Sung Han, Hee-Bom Kim, 2007, SPIE Advanced Lithography.

Real-time monitoring based on comprehensive analysis of the haze environment under the pellicle film

Seong-Woon Choi, Woo-Sung Han, Jaehyuck Choi, 2006, SPIE Photomask Technology.

Fluorocarbon-based single-layer resist for 157-nm lithography

Woo-Sung Han, Sang-Gyun Woo, Kenji Honda, 2002, SPIE Advanced Lithography.

Application of multistep quartz etching method to strong PSMs

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2001, Photomask Japan.

Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Han-Ku Cho, Dong-Hoon Chung, Hyung-Do Kim, 2003, Photomask Japan.

ArF issues of 90-nm-node DRAM device integration

Jung-Hyeon Lee, Han-Ku Cho, Joo-Tae Moon, 2003, SPIE Advanced Lithography.

Mask considerations for manufacturing assist features

Byeong-soo Kim, Ji-Hyeon Choi, Seong-Woon Choi, 2001, SPIE Advanced Lithography.

Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication

Han-Ku Cho, Woo-Sung Han, Jin Hong, 2004, SPIE Advanced Lithography.

Lithography technology trend for DRAM devices

Woo-Sung Han, 2002, Photomask Japan.

New method of tilted illumination using grating mask: advanced tilted illumination on mask

Woo-Sung Han, Chul Hong Kim, Hoyoung Kang, 1993, Advanced Lithography.

Overcoming global topography and improving lithographic performance using a transmittance controlled mask

Woo-Sung Han, Hoyoung Kang, Young-Bum Koh, 1994, Advanced Lithography.

Realization of sub-80-nm small-space patterning in ArF photolithography

Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, 2004, SPIE Advanced Lithography.

Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Dong-Hoon Chung, In-Gyun Shin, Yong-Hoon Kim, 2001, SPIE Advanced Lithography.

Resolution improvement of chemical-amplification resist using process-induced effect correction

Ji-Hyeon Choi, Seong-Woon Choi, Woo-Sung Han, 2001, Photomask Japan.

Dose latitude dependency on resist contrast in e-beam mask lithography

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2000, Photomask Japan.

Experimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2001, SPIE Photomask Technology.

Optical proximity correction using a transmittance-controlled mask (TCM)

Woo-Sung Han, Yongbeom Kim, Hoyoung Kang, 1995, Advanced Lithography.

Improved process control of photomask fabrication in e-beam lithography

Woo-Sung Han, Jung-Min Sohn, Yo-Han Choi, 2001, SPIE Photomask Technology.

New approach for quartz dry etching using hardmask for sub-90-nm photomask technology

Sungmin Huh, Woo-Sung Han, Sung-Woon Choi, 2004, Photomask Japan.

Design and properties of new deep-UV positive photoresist

Woo-Sung Han, Chang-Hwan Kim, Sang-Jun Choi, 1996, Advanced Lithography.

A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect

Seong-Woon Choi, Woo-Sung Han, Hyuk-Joo Kwon, 2005, SPIE Photomask Technology.

Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, 2004, SPIE Advanced Lithography.

Optical proximity correction of bit line pattern in DRAM devices

Woo-Sung Han, Yongbeom Kim, Hoyoung Kang, 1996, Advanced Lithography.

Improved modeling of fogging and loading effect correction

Seong-Woon Choi, Woo-Sung Han, Seong-Yong Moon, 2005, SPIE Photomask Technology.

Comprehensive Approach to Determining the Specification for Mask Mean to Target

Jung-hyun Lee, Insung Kim, Han-Ku Cho, 2002, Photomask Technology.

Validation of ArF Chromeless PSM in the Sub-100 nm Node DRAM Cell

Han-Ku Cho, Dong-Hoon Chung, Woo-Sung Han, 2002, Photomask Technology.

Quantitative analysis of develop loading effect and its application

Seong-Woon Choi, Woo-Sung Han, Seong-Yong Moon, 2004, SPIE Photomask Technology.

Load balancing using DP management server for commercial MDP software

Seong-Woon Choi, Woo-Sung Han, JongWon Kim, 2006, SPIE Photomask Technology.

Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions

Woo-Sung Han, Sang-Gyun Woo, Young-Bum Koh, 1995, Photomask and Next Generation Lithography Mask Technology.

Study of the beam blur and its effect on the future mask fabrication

Seong-Woon Choi, Woo-Sung Han, Jonggul Doh, 2006, SPIE Photomask Technology.

Monitoring system of CD error analysis for the 90-nm node mask manufacturing

Woo-Sung Han, Yong-Hoon Kim, Hee-Sun Yoon, 2005, Photomask Japan.

Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes

Woo-Sung Han, Sang-Gyun Woo, Hoyoung Kang, 1996, Advanced Lithography.

Novel surface silylation process for chemically amplified photoresist

Woo-Sung Han, Jin Hong, Sang-Gyun Woo, 2002, SPIE Advanced Lithography.

The study of optical performance for quartz dry etching quality in ArF lithography

Seong-Woon Choi, Woo-Sung Han, Hyuk-Joo Kwon, 2006, SPIE Photomask Technology.

Application of chemically amplified resist to 10-keV e-beam system

Seung-Hune Yang, Seong-Woon Choi, Woo-Sung Han, 2001, Photomask Japan.

Way for LEEPL technology to succeed in memory device application

Insung Kim, Han-Ku Cho, Joo-Tae Moon, 2004, SPIE Advanced Lithography.

Repair simulation with image processing and artificial intelligence

Woo-Sung Han, Ji-Hyung Lee, Sung-Woon Choi, 2005, SPIE Advanced Lithography.

Methodology of flare modeling and compensation in EUVL

Insung Kim, Seong-Woon Choi, Woo-Sung Han, 2008, Lithography Asia.

Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, 2003, SPIE Advanced Lithography.

Optical proximity correction considering mask manufacturability and its application to 0.25-μm DRAM for enhanced device performance

Ji-Hyeon Choi, Woo-Sung Han, Young-Kwan Park, 2000, Advanced Lithography.

Deep-UV positive-tone dry-development process using chemically amplified resist and its application to 256 Mbit DRAM

Woo-Sung Han, Hoyoung Kang, Young-Bum Koh, 1993, Advanced Lithography.

Study of Cr patch validity for ArF CPL mask and its fabrication

In-Gyun Shin, Woo-Sung Han, Sung-Woon Choi, 2004, SPIE Advanced Lithography.

Doubly exposed patterning characteristics using two alternating phase-shift masks

In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, 2001, European Mask and Lithography Conference.

Analysis of various blur effects on mask CD distortion

Woo-Sung Han, Sang-Hee Lee, Hak-Seung Han, 2005, SPIE Photomask Technology.

Analysis of in-field uniformity on wafer considering exposure margin and MEEF

Woo-Sung Han, Hee-Sun Yoon, Chan-Uk Jeon, 2004, SPIE Photomask Technology.

CD uniformity improvement for 3x nm node devices

Hyung-Do Kim, Seong-Woon Choi, Woo-Sung Han, 2008, Lithography Asia.

Control of CD errors and hotspots by using a design based verification system

Sang-Ho Lee, Woo-Sung Han, Bong-Seok Choi, 2009, Lithography Asia.

Photoresist thickness variation due to local and global topography

Woo-Sung Han, Hye-Keun Oh, Jin-Young Kim, 2001, SPIE Advanced Lithography.

Effect of mask reduction ratio in alternating phase-shift masks

In-Gyun Shin, Yong-Hoon Kim, Woo-Sung Han, 2001, SPIE Photomask Technology.

The characterization of line-width in mask using spectrophotometry

Yong-Hoon Kim, Woo-Sung Han, Yo-Han Choi, 2006, Photomask Japan.

In-shot (intra-field) overlay measurement considering overlay mark pattern dependency and illumination source dependency

Woo-Sung Han, Sang-ho Lee, Yong-jin Cho, 2009, Lithography Asia.

Process monitoring system for instant defect detection and analysis in 65 nm node photomask fabrications

Seong-Woon Choi, Woo-Sung Han, Young-Seok Cho, 2005, Photomask Japan.

Comparative study on optical proximity effect correction with various types of dummy patterns and its application to DRAM devices

Woo-Sung Han, Hoyoung Kang, Young-Bum Koh, 1994, Advanced Lithography.

Flare-induced CD variation correction using transmittance controlled mask

Gi-Sung Yeo, Han-Ku Cho, Woo-Sung Han, 2003, SPIE Advanced Lithography.

Comparison of ArF bilayer resists for sub-90 nm L/S fabrication

Han-Ku Cho, Woo-Sung Han, Jin Hong, 2003, SPIE Advanced Lithography.

Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Gi-Sung Yeo, Han-Ku Cho, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Application of alternating phase shift mask to device fabrication

Woo-Sung Han, Sang-Gyun Woo, Sung-Gi Kim, 1995, Advanced Lithography.

Effect of beam blur in mask fabrication

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2001, SPIE Photomask Technology.

Reduction of MDP complexity through the application of OASIS based data flow

Ji-Hyeon Choi, Seong-Woon Choi, Woo-Sung Han, 2005, SPIE Photomask Technology.

Exposure of a halftone mask by conventional and off-axis illumination

Woo-Sung Han, Hye-Keun Oh, Cheol-Hong Kim, 1994, Advanced Lithography.

Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design

Han-Ku Cho, Woo-Sung Han, Chan Hwang, 2003, SPIE Advanced Lithography.

Application of e-beam chemically amplified resist to devices below 0.18-μm node

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2001, European Mask and Lithography Conference.

Practical requirement for reflectivity control in sub 30nm device using high NA immersion lithography

Seong-Woon Choi, Woo-Sung Han, Jin-Young Yoon, 2008, Lithography Asia.

Reduction of MDP time through the improvement of verification method

Ji-Hyeon Choi, Seong-Woon Choi, Woo-Sung Han, 2006, Photomask Japan.

Shifter slope variation effect of embedded half-tone phase-shift masks

Woo-Sung Han, Sang-Gyun Woo, Seong-Yong Moon, 1995, Photomask Technology.

Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Evaluation of puddle time effect and optimization of development process in 193-nm lithography

Han-Ku Cho, Woo-Sung Han, Hyung-Rae Lee, 2004, SPIE Advanced Lithography.

Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system

Ji-Hyeon Choi, Woo-Sung Han, Sung-Woon Choi, 2004, Photomask Japan.

Study of machine to machine overlay error for sub-60-nm memory devices

Woo-Sung Han, Jangho Shin, Jung-Hyeon Lee, 2008 .

Exposed area ratio dependent etching in a submicron self-aligned contact etching

Woo-Sung Han, Chang-Jin Kang, J. Moon, 2002 .

Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology

Joo-Tae Moon, Woo-Sung Han, Shahid Rauf, 2009 .

Flare in Microlithographic Exposure Tools

Woo-Sung Han, Jung-Min Sohn, Sung-Woon Choi, 2002 .

Most Efficient Alternative Manner of Patterning sub-80 nm Contact Holes and Trenches with 193 nm Lithography

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004 .

A new correction method for dry etch loading effect in photomask fabrication

Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, 2000 .