E. Hildebrandt
发表
A. Gloskovskii,
P. Zaumseil,
T. Schroeder,
2014
.
T. Schroeder,
L. Alff,
P. Komissinskiy,
2014
.
M. Lehmann,
L. Molina‐Luna,
H. Kleebe,
2017
.
Electron holography on HfO2/HfO2−x bilayer structures with multilevel resistive switching properties
M. Lehmann,
E. Pérez,
C. Wenger,
2017,
Nanotechnology.
C. M. Hamm,
L. Alff,
Hongbin Zhang,
2016
.
M. Yıldırım,
L. Alff,
E. Hildebrandt,
2011
.
L. Alff,
P. Komissinskiy,
Hongbin Zhang,
2018
.
R. Waser,
K. Szot,
L. Alff,
2016,
1606.08227.
P. Zaumseil,
T. Schroeder,
M. Schubert,
2014,
ACS applied materials & interfaces.
M. Frotscher,
L. Alff,
A. Senyshyn,
2012
.
M. Frotscher,
L. Alff,
A. Senyshyn,
2013
.
M. Farle,
L. Alff,
S. Sabet,
2017
.
M. Farle,
L. Alff,
S. Sabet,
2017,
IEEE Transactions on Magnetics.
L. Alff,
S. Sharath,
S. Sharma,
2017
.
H. Kleebe,
T. Schroeder,
L. Alff,
2011,
1111.2785.
C. Kübel,
L. Alff,
M. Fawey,
2019,
Physical Review Applied.
M. Yi,
C. Kübel,
L. Alff,
2018,
Physical Review B.
M. Yi,
L. Alff,
M. Fawey,
2018,
Physical Review B.
L. Alff,
E. Hildebrandt,
D. Gölden,
2017
.
L. Molina‐Luna,
H. Kleebe,
L. Alff,
2017,
Ultramicroscopy.
L. Alff,
S. Sabet,
E. Hildebrandt,
2017
.
C. Trautmann,
L. Alff,
S. Sharath,
2019,
IEEE Transactions on Nuclear Science.
L. Alff,
J. Kurian,
E. Hildebrandt,
2012,
1211.5215.
J. Rödel,
E. Hildebrandt,
D. Hawelka,
2013
.
L. Molina‐Luna,
C. Wenger,
L. Alff,
2019,
Semiconductor Science and Technology.