T. Mollenhauer

发表

Silicon etch process options for micro- and nanotechnology using inductively coupled plasmas

M. Lemme, T. Wahlbrink, A. Goodyear, 2006 .

Scalable gate first process for silicon on insulator metal oxide semiconductor field effect transistors with epitaxial high-k dielectrics

H. Kurz, M. Lemme, T. Echtermeyer, 2006 .

Fabrication of high efficiency SOI taper structures

Heinrich Kurz, Jens Bolten, Michael Först, 2009 .

Organic mixed-order photonic crystal lasers with ultrasmall footprint

N. Moll, T. Stöferle, R. Mahrt, 2007 .

Fabrication of MOSFETs by 3D soft UV-nanoimprint

H. Kurz, T. Mollenhauer, C. Moormann, 2012 .

Leakage Current Mechanisms in Epitaxial Gd2O3 High-k Gate Dielectrics

H. Kurz, Michael Schmidt, M. Lemme, 2008 .

Fabrication of 12 nm electrically variable shallow junction metal–oxide–semiconductor field effect transistors on silicon on insulator substrates

H. Kurz, A. Fuchs, Y. Georgiev, 2003 .

Investigation of high-K gate stacks with epitaxial Gd2O3 and FUSI NiSi metal gates down to CET=0.86 nm

H. Kurz, Michael Schmidt, M. Lemme, 2006 .

Gentle FUSI NiSi metal gate process for high-k dielectric screening

P. Hurley, H. Kurz, K. Cherkaoui, 2008 .

Tungsten work function engineering for dual metal gate nano-CMOS

J. K. Efavi, Max C. Lemme, Heinrich Kurz, 2005 .

Total Oxidation of Propane by using Platinum-Group-Metal Catalysts Recovered from Fuel-Cell Recycling

B. Ondruschka, P. Scholz, T. Mollenhauer, 2013 .

Nickel-silicide process for ultra-thin-body SOI-MOSFETs

H. Kurz, S. Cristoloveanu, Michael Schmidt, 2005 .

CMOS integration of epitaxial Gd2O3 high-k gate dielectrics

J. K. Efavi, Max C. Lemme, Michael Schmidt, 2006 .

Highly selective etch process for silicon-on-insulator nano-devices

H. Kurz, Y. Georgiev, M. Lemme, 2005 .

Fabrication and characterization of Ta2O5 photonic feedback structures

H. Kurz, N. Moll, T. Stöferle, 2008 .

Nanoscale TiN metal gate technology for CMOS integration

H. Kurz, Michael Schmidt, M. Lemme, 2006 .

Ultrafast all-optical modulator with femtojoule absorbed switching energy in silicon-on-insulator.

M. Dahlem, H. Kurz, B. Offrein, 2010, Optics express.

Ultracompact silicon/polymer laser with an absorption-insensitive nanophotonic resonator.

N. Moll, T. Stöferle, U. Scherf, 2010, Nano letters.

0.86-nm CET Gate Stacks With Epitaxial$hboxGd_2hboxO_3$High-$k$Dielectrics and FUSI NiSi Metal Electrodes

H. J. Osten, H. Kurz, E. Bugiel, 2006, IEEE Electron Device Letters.

Circular grating resonators as candidates for ultra-small photonic devices

Thomas Mollenhauer, Rainer F. Mahrt, Bert J. Offrein, 2008, SPIE Photonics Europe.

Highly selective HBr etch process for fabrication of triple-gate nano-scale SOI-MOSFETs

J. K. Efavi, Max C. Lemme, Heinrich Kurz, 2004 .