M. Forsberg

Shallow and Deep Trench Isolation for use in RF-Bipolar IC:s

T. Johansson, M. Forsberg, C. Bormander, 2000, 30th European Solid-State Device Research Conference.

Effect of dopants on chemical mechanical polishing of Silicon

J. Olsson, M. Forsberg, N. Keskitalo, 2002 .

InP and Si metal-oxide semiconductor structures fabricated using oxygen plasma assisted wafer bonding

M. Forsberg, D. Pasquariello, M. Camacho, 2003 .

Effect of process parameters on material removal rate in chemical mechanical polishing of Si(100)

Markus Forsberg, M. Forsberg, 2005 .

A Base-Collector Architecture for SiGe HBTs using Low-Temperature CVD Epitaxy Combined with Chemical-Mechanical Polishing

E. Haralson, J. Grahn, H. Radamson, 2002 .