Harry J. Levinson

发表

EUV mask making: an approach based on the direct patterning of the EUV reflector

Christian Chovino, Laurent Dieu, Eric Johnstone, 2003, SPIE Photomask Technology.

Modeling and Thin-Film Effects

Harry J. Levinson, 2005 .

Lithography equipment: what is out there and what is coming

Harry J. Levinson, 1991, Tutorial Texts in Optical Engineering Series.

Minimization of total overlay errors on product wafers using an advanced optimization scheme

Harry J. Levinson, Moshe Preil, Patrick J. Lord, 1997, Advanced Lithography.

Printing EUV Phase-shift Masks using the 0.3NA BerkeleyMicro-exposure Tool

Christian Chovino, Harry J. Levinson, Adam R. Pawloski, 2005 .

Electrical linewidth measurement for next-generation lithography

Harry J. Levinson, Jongwook Kye, 2001, SPIE Advanced Lithography.

The potential of EUV lithography

Harry J. Levinson, 2019, European Mask and Lithography Conference.

Comparative study of line width roughness (LWR) in next-generation lithography (NGL) processes

Costas J. Spanos, Harry J. Levinson, Thomas I. Wallow, 2010, Advanced Lithography.

Optical Pattern Formation

Harry J. Levinson, 2005 .

EUV OPC for the 20-nm node and beyond

Lei Sun, Obert R. Wood, Harry J. Levinson, 2012, Advanced Lithography.

Process-induced defects in sub-0.15-nm device patterning using 193-nm lithography

Harry J. Levinson, Uzodinma Okoroanyanwu, Christopher Lee Pike, 2000, Advanced Lithography.

Control of Operations

Harry J. Levinson, H. Levinson, 2009 .

Lithography Process Control

Harry J. Levinson, H. Levinson, 1999 .

Issues and nonissues on a 193-nm step-and-scan system in production

Harry J. Levinson, Bob Streefkerk, Uzodinma Okoroanyanwu, 2000, Advanced Lithography.

Extending EUV Lithography

Harry J. Levinson, 2020 .

Influence of antireflection coatings in ArF lithography

Christian Chovino, Laurent Dieu, Eric Johnstone, 2003, SPIE Photomask Technology.

Spacer-defined double patterning for 20nm and beyond logic BEOL technology

Harry J. Levinson, Sean D. Burns, Martin Burkhardt, 2011, Advanced Lithography.

Flare and its impact on low-k1 KrF and ArF lithography

Bruno M. La Fontaine, Harry J. Levinson, Anatoly Bourov, 2002, SPIE Advanced Lithography.

Lithography and design integration — New paradigm for the technology architecture development

Lei Yuan, Yunfei Deng, Harry J. Levinson, 2012, Proceedings of the IEEE 2012 Custom Integrated Circuits Conference.

Semiconductor process control

Harry J. Levinson, Lynda C. Hannemann-Mantalas, 1994, Advanced Lithography.

Integration considerations for 130-nm device patterning using ArF lithography

Harry J. Levinson, Uzodinma Okoroanyanwu, Chih-Yuh Yang, 2000, Advanced Lithography.

Manufacturability of the ultrathin resist process

Harry J. Levinson, Khoi A. Phan, Khanh B. Nguyen, 2000, Advanced Lithography.

Managing Quality Improvement on a Development Pilot Line

Harry J. Levinson, Jake Ben-Jacob, 1996 .

RELAX: resolution enhancement by laser-spectrum adjusted exposure

Harry J. Levinson, Nigel R. Farrar, Kazuhiro Takahashi, 2004, SPIE Advanced Lithography.

Double exposure using 193nm negative tone photoresist

Harry J. Levinson, Jongwook Kye, Tom Wallow, 2007, SPIE Advanced Lithography.

Impact of optical absorption on process control for sub-0.15-nm device patterning using 193-nm lithography

Harry J. Levinson, Bhanwar Singh, Uzodinma Okoroanyanwu, 2000, Advanced Lithography.

Considerations for high-numerical aperture EUV lithography

Lei Sun, Harry J. Levinson, Paul W. Ackmann, 2013, Advanced Lithography.

Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Harry J. Levinson, Bruno La Fontaine, Oleg Kritsun, 2007, SPIE Advanced Lithography.

The transfer of photoresist LER through etch

Harry J. Levinson, Adam R. Pawloski, Bruno La Fontaine, 2006, SPIE Advanced Lithography.

Technological innovations for a sustainable business model in the semiconductor industry

Harry J. Levinson, 2014, Optics & Photonics - Optical Engineering + Applications.

Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors

Obert R. Wood, Christian Chovino, Laurent Dieu, 2004, SPIE Advanced Lithography.

ISO 9000: What every microlithographer should know

Harry J. Levinson, 1994 .

Polarization aberration analysis using Pauli-Zernike representation

Harry J. Levinson, Jongwook Kye, Norihiro Yamamoto, 2007, SPIE Advanced Lithography.

Demonstration of phase-shift masks for extreme-ultraviolet lithography

Christian Chovino, Harry J. Levinson, Adam R. Pawloski, 2006, SPIE Advanced Lithography.

Considerations in source-mask optimization for logic applications

Yunfei Deng, Harry J. Levinson, Jongwook Kye, 2010, Advanced Lithography.

CONTROL AND IMPROVEMENT OF COMPLEX PROCESSES

Harry J. Levinson, H. Levinson, 1992 .

Principles of Lithography, Fourth Edition

Harry J. Levinson, 2019 .

Spacer defined double patterning for sub-72 nm pitch logic technology

Harry J. Levinson, Greg McIntyre, Yuansheng Ma, 2010, Advanced Lithography.

Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging

Bruno M. La Fontaine, Harry J. Levinson, Andrew R. Neureuther, 2003, SPIE Advanced Lithography.

Evolution in the concentration of activities in lithography

Harry J. Levinson, 2016, SPIE Advanced Lithography.

Factors that determine the optimum reduction factor for wafer steppers

Harry J. Levinson, Paul W. Ackmann, Moshe E. Preil, 1999, Advanced Lithography.

Decomposition strategies for self-aligned double patterning

Yunfei Deng, Harry J. Levinson, Huixiong Dai, 2010, Advanced Lithography.

A toast to Lithography's past: what we learned from technologies not used in HVM (Conference Presentation)

Harry J. Levinson, Chris A. Mack, 2020 .

Comparative study of mask architectures for EUV lithography

Harry J. Levinson, Adam R. Pawloski, Bruno La Fontaine, 2004, SPIE Photomask Technology.

Lithography equipment

Harry J. Levinson, 1991, Tutorial Texts in Optical Engineering Series.

Edge placement error fundamentals and impact of EUV: will traditional design-rule calculations work in the era of EUV?

Harry J. Levinson, Timothy A. Brunner, Xuemei Chen, 2018 .

Self-aligned double patterning (SADP) compliant design flow

Harry J. Levinson, Yan Wang, Jason Sweis, 2012, Advanced Lithography.

Current challenges and opportunities for EUV lithography

Harry J. Levinson, Timothy A. Brunner, 2018, Photomask Technology.

Spherical aberration measurement and in-situ correction

Harry J. Levinson, Jongwook Kye, Alden Acheta, 2002, SPIE Advanced Lithography.

EPE fundamentals and impact of EUV: Will traditional design-rule calculations work in the era of EUV?

Harry J. Levinson, Xuemei Chen, James A. Culp, 2018, Advanced Lithography.

Mask topography effect with polarization at hyper NA

Harry J. Levinson, Jongwook Kye, Norihiro Yamamoto, 2006, SPIE Advanced Lithography.

Characterization of photo-acid redeposition in 193-nm photoresists

Harry J. Levinson, Brian MacDonald, Bruno La Fontaine, 2007, SPIE Advanced Lithography.

Characterization, modeling, and impact of scattered light in low-k1 lithography

Harry J. Levinson, Anita Fumar-Pici, Yunfei Deng, 2004, SPIE Advanced Lithography.

Principles of Lithography

Harry J. Levinson, H. Levinson, 2001 .

Optimization of stochastic EUV resist models parameters to mitigate line edge roughness

John J. Biafore, Harry J. Levinson, Azat Latypov, 2017, Advanced Lithography.

Polarization aberration analysis in optical lithography systems

Harry J. Levinson, Gregory McIntyre, Jongwook Kye, 2006, SPIE Advanced Lithography.

Study of the influence of substrate topography on the focusing performance of advanced lithography scanners

Bruno M. La Fontaine, Harry J. Levinson, Anita Fumar-Pici, 2003, SPIE Advanced Lithography.

Computational study of line tip printability of sub-20-nm technology

Harry J. Levinson, Thomas I. Wallow, Jongwook Kye, 2012, Advanced Lithography.

Overview of Lithography: Challenges and Metrologies

Harry J. Levinson, 2003 .

Systematic assessment of the contributors of line edge roughness in EUV lithography using simulations

John J. Biafore, Harry J. Levinson, Azat Latypov, 2018, Advanced Lithography.

Linewidth asymmetry study to predict aberration in lithographic lenses

Harry J. Levinson, Mircea Dusa, Jongwook Kye, 2001, SPIE Advanced Lithography.

Taking EUV Lithography from the Laboratory to the Factory

Harry J. Levinson, 2008 .

Process Drift and Automatic Process Control

Harry J. Levinson, 2009 .

Lithography and mask challenges at the leading edge

Harry J. Levinson, 2015, SPIE Photomask Technology.

A lithographic and process assessment of photoresist stabilization for double-patterning using 172-nm photoresist curing

Junyan Dai, Harry J. Levinson, James Yu, 2008, SPIE Advanced Lithography.

The Limits of Optical Lithography

Harry J. Levinson, 2005 .

Simple and Complex Processes

Harry J. Levinson, 2009 .

Separating the optical contributions to line-edge roughness in EUV lithography using stochastic simulations

John J. Biafore, Harry J. Levinson, Azat Latypov, 2017, Advanced Lithography.

Characterization of line-edge roughness in photoresist using an image fading technique

Bruno M. La Fontaine, Harry J. Levinson, Adam R. Pawloski, 2004, SPIE Advanced Lithography.

Overlay accuracy in 0.18-μm copper dual-damascene process

Harry J. Levinson, Joel L. Seligson, Rolf Seltmann, 2002, SPIE Advanced Lithography.

22 nm technology node active layer patterning for planar transistor devices

Scott Halle, Aasutosh Dave, Harry J. Levinson, 2009, Advanced Lithography.

Lithography target optimization with source-mask optimization

Harry J. Levinson, Yunfei Deng, Jongwook Kye, 2012, Advanced Lithography.

The lithographer's dilemma: shrinking without breaking the bank

Harry J. Levinson, H. Levinson, 2013, Other Conferences.

Analysis of focus errors in lithography using phase-shift monitors

Bruno M. La Fontaine, Harry J. Levinson, Jongwook Kye, 2002, SPIE Advanced Lithography.

The use of EUV lithography to produce demonstration devices

John Arnold, Harry J. Levinson, Sander Bouten, 2008, SPIE Advanced Lithography.

Managing Within Budget Overlay Metrology Accuracy in a 0.18 µm Copper Dual Damascene Process

Harry J. Levinson, Rolf Seltmann, Joel L. Seligson, 2002 .

Defect printability for sub-0.18-micron design rules using 193-nm lithography process and binary OPC reticle

Christopher A. Spence, Harry J. Levinson, Khoi A. Phan, 2000, Advanced Lithography.

Journal Split Will Refocus Technical Communities

Harry J. Levinson, Hans Zappe, 2020 .

Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Harry J. Levinson, Bruno La Fontaine, Oleg Kritsun, 2007, SPIE Advanced Lithography.

Overlay Tolerances For VLSI Using Wafer Steppers

Harry J. Levinson, Rory Rice, 1988, Advanced Lithography.

Introduction to the Use of Statistical Process Control in Lithography

Harry J. Levinson, 2009 .

Double patterning compliant logic design

Yunfei Deng, Harry J. Levinson, Huixiong Dai, 2011, Advanced Lithography.

Technologies for Microlithography Manufacturing

Harry J. Levinson, Andrew R. Neureuther, Willard E. Conley, 1995 .

Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations

Andrew R. Neureuther, Harry J. Levinson, Gregory McIntyre, 2006 .

Metrology requirements for lithography's next wave

Harry J. Levinson, 2004, SPIE Advanced Lithography.

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations in 32-nm node standard cell

Yunfei Deng, David Z. Pan, Harry J. Levinson, 2010, Advanced Lithography.

Lithography: a look at what is ahead

Harry J. Levinson, 2000, SPIE Optics + Photonics.

Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

Harry J. Levinson, Bruno La Fontaine, Yuansheng Ma, 2007, SPIE Advanced Lithography.

A method for patterning of line-type features using a multi-patterning process, which allows the use of closer Kontakteinschlußabstandsregeln

Lei Yuan, Harry J. Levinson, Jongwook Kye, 2015 .

Another look at stepper lens reduction and field size

Harry J. Levinson, Paul Ackmann, Lori Peters, 2000, Photomask Japan.

Review of resist-based flare measurement methods for extreme ultraviolet lithography

Lei Sun, Wenhui Wang, Harry J. Levinson, 2013 .

Focus : The Critical Parameter For Submicron Optical Lithography :Part 2

Harry J. Levinson, William H. Arnold, 1987, Advanced Lithography.

Correlation of experimental and simulated cure-induced photoresist distortions in double patterning

Harry J. Levinson, Thomas I. Wallow, Mahidhar Rayasam, 2009, Advanced Lithography.

DPT restricted design rules for advanced logic applications

Yunfei Deng, Harry J. Levinson, Jason Sweis, 2011, Advanced Lithography.

SADP for BEOL using chemical slimming with resist mandrel for beyond 22nm nodes

Harry J. Levinson, Sudhar Raghunathan, Jongwook Kye, 2012, Other Conferences.

Proposal for determining exposure latitude requirements

Harry J. Levinson, Rolf Seltmann, Bruno La Fontaine, 2008, SPIE Advanced Lithography.

Line edge roughness impact on critical dimension variation

Harry J. Levinson, Yuansheng Ma, Thomas Wallow, 2007, SPIE Advanced Lithography.

The significance of rigorous electromagnetic field simulation on mask development for 20nm optical lithography technology

Yunfei Deng, Harry J. Levinson, Martin Sczyrba, 2012, Photomask Technology.

Publication guidelines for metrology and masks

Harry J. Levinson, H. Levinson, 2021 .

A Study of Photoresist Pattern Freezing for Double Imaging using 172nm VUV Flood Exposure

Harry J. Levinson, Jongwook Kye, Yamaguchi Masanori, 2008 .

Line edge roughness and intrinsic bias for two methacrylate polymer resist systems

Harry J. Levinson, Adam R. Pawloski, Carlton G Willson, 2006 .

Application of contrast enhancement layer to 193nm lithography

Harry J. Levinson, Ryoung-han Kim, 2007 .

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations

David Z. Pan, Harry J. Levinson, Yongchan Ban, 2010 .

Screening layouts for high-numerical aperture and polarization effects using pattern matching

Harry J. Levinson, Andrew R. Neureuther, Gregory McIntyre, 2005 .

Lithography – Green and Getting Greener

Harry J. Levinson, 2011 .

22-nm-node technology active-layer patterning for planar transistor devices

Scott Halle, Aasutosh Dave, Harry J. Levinson, 2010 .

Characterization of the manufacturability of ultrathin resist

Harry J. Levinson, Khoi A. Phan, Khanh B. Nguyen, 1999 .

Lithography using ultrathin resist films

Harry J. Levinson, Uzodinma Okoroanyanwu, Christopher Lee Pike, 2000 .

Improving lithography pattern fidelity and line-edge roughness by reducing laser speckle

Harry J. Levinson, Nigel R. Farrar, Oleg Kritsun, 2008 .