J. Metzger

Impact of the Ferroelectric Stack Lamination in Si Doped Hafnium Oxide (HSO) and Hafnium Zirconium Oxide (HZO) Based FeFETs: Toward High-Density Multi-Level Cell and Synaptic Storage

Johannes Müller, J. van Houdt, R. Hoffmann, 2021, Electronic Materials.

A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: A Temperature-Modulated Operation

R. Hoffmann, L. Eng, M. Czernohorsky, 2020, IEEE Transactions on Electron Devices.

A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: Pyroelectricity and Reliability

R. Hoffmann, L. Eng, M. Czernohorsky, 2020, IEEE Transactions on Electron Devices.

Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films

Johannes Müller, R. Hoffmann, L. Eng, 2022, Advanced Electronic Materials.

The application of low energy ion scattering spectroscopy (LEIS) in sub 28‐nm CMOS technology

H. Engelmann, E. Erben, H. Brongersma, 2017 .

Impact of both metal composition and oxygen/nitrogen profiles on p-channel metal-oxide semiconductor transistor threshold voltage for gate last high-k metal gate

C. Prindle, A. Wei, H. Engelmann, 2013 .

Impact of the Nonlinear Dielectric Hysteresis Properties of a Charge Trap Layer in a Novel Hybrid High-Speed and Low-Power Ferroelectric or Antiferroelectric HSO/HZO Boosted Charge Trap Memory

Johannes Müller, J. van Houdt, R. Hoffmann, 2021, IEEE Transactions on Electron Devices.

A Novel Hybrid High-Speed and Low Power Antiferroelectric HSO Boosted Charge Trap Memory for High-Density Storage

J. V. Houdt, R. Hoffmann, L. Eng, 2020, 2020 IEEE International Electron Devices Meeting (IEDM).

Ferroelectric HfO2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology

Johannes Müller, D. Marinskiy, Marshall Wilson, 2017 .