M. Bender

Fabrication of nanostructures using a UV-based imprint technique

H. Kurz, B. Spangenberg, M. Otto, 2000 .

Characterization and application of a UV-based imprint technique

H. Kurz, B. Spangenberg, M. Otto, 2001 .

Wafer scale patterning by soft UV-nanoimprint lithography

H. Kurz, T. Glinsner, A. Fuchs, 2004 .

Reproducibility and homogeneity in step and repeat UV-nanoimprint lithography

Heinrich Kurz, Bernd Spangenberg, R. Jede, 2004 .

A holistic metrology sensitivity study for pattern roughness quantification on EUV patterned device structures with mask design induced roughness

Brid Connolly, Gaoliang Dai, Ilan Englard, 2018, Metrology, Inspection, and Process Control for Microlithography XXXII.

High resolution lithography with PDMS molds

Thomas Glinsner, Heinrich Kurz, A. Fuchs, 2004 .

Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material

Heinrich Kurz, Jens Bolten, A. Fuchs, 2007 .

Status and prospects of UV-Nanoimprint technology

A. Fuchs, U. Plachetka, H. Kurz, 2006 .

3D structures for UV-NIL template fabrication with grayscale e-beam lithography

A. Fuchs, U. Plachetka, Ulrich Barth, 2007 .