Leon Levasier

Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing

Marcel Beckers, Marcel Mastenbroek, Chia-Wei Hung, 2018, Advanced Lithography.

EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update

Hans Meiling, Mark van de Kerkhof, Leon Levasier, 2018, Advanced Lithography.

EUV lithography industrialization progress

Mark van de Kerkhof, Leon Levasier, Roderik van Es, 2017, Photomask Technology.

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

Tilmann Heil, Eelco van Setten, Christian Wagner, 2007, SPIE Advanced Lithography.

EUV lithography introduction at Chipmakers

Judon Stoeldraijer, Hans Meiling, Peter Kuerz, 2011, Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications.

Performance results of a new generation of 300-mm lithography systems

Marc Boonman, Leon Levasier, Tom Castenmiller, 2001, SPIE Advanced Lithography.

Large dynamic range Atomic Force Microscope for overlay improvements

Arie den Boef, Leon Levasier, Gert Witvoet, 2016, SPIE Advanced Lithography.

Estimation of deviations between stylus position and CMM scales indication in high speed probing

Ryoshu Furutani, Leon Levasier, Pieter Schellekens, 1997 .

Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens, Bob Streefkerk, Leon Levasier, 2007, SPIE Advanced Lithography.

EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100

Judon Stoeldraijer, Hans Meiling, Peter Kuerz, 2011, Advanced Lithography.

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Leon Levasier, Roderik van Es, 2017, Advanced Lithography.