K. Yamashita

A Strategic Optical Lithography for Below 0.25Micron Design Rules

T. Matsuo, N. Nomura, M. Endo, 1993 .

Heterodyne holographic nanometer alignment for a half-micron wafer stepper

Noboru Nomura, Masaki Suzuki, Keiji Kubo, 1990, Advanced Lithography.

Performance of 0.2 μm optical lithography using KrF and ArF excimer laser sources

Masaru Sasago, Noboru Nomura, Masayuki Endo, 1993 .

Fabrication and resist exposure characteristics of 50 keV nanometer e‐beam lithography system

S. Namba, K. Gamo, N. Samoto, 1985 .