C. Clifford

Compensation methods for buried defects in extreme ultraviolet lithography masksa)

Tina T. Chan, A. Neureuther, C. Clifford, 2011 .

Modeling Optical Lithography Physics

Eric Y. Chin, Marshal A. Miller, L. Wang, 2010 .

Achieving Indigenous Involvement in Management of Protected Areas: Lessons from Recent Australian Experience

M. Lane, C. Clifford, Tony Corbett, 1998 .

Fast simulation of buried EUV mask defect interaction with absorber features

Andrew R. Neureuther, Chris Clifford, A. Neureuther, 2007, SPIE Advanced Lithography.