Akifumi Tokimasa

Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent Extreme-Ultraviolet Scatterometry Microscope

Takeo Watanabe, H. Kinoshita, T. Harada, 2012 .

Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology

K. Midorikawa, Takeo Watanabe, H. Kinoshita, 2012 .

Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent Extreme-Ultraviolet Scatterometry Microscope

Takeo Watanabe, H. Kinoshita, T. Harada, 2012 .

Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology

K. Midorikawa, Takeo Watanabe, H. Kinoshita, 2012 .

Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope

Tsuneo Terasawa, Ryoichi Hirano, Susumu Iida, 2013 .