C. Anderson

发表

Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source.

E. Anderson, W. Chao, F. Salmassi, 2014, Optics express.

Enabling EUV Ressist Research at the 1 and Smaller Regime

Kenneth A. Goldberg, Patrick P. Naulleau, Mark Neisser, 2015 .

EUV Resists: Pushing to the Extreme

Patrick P. Naulleau, Mark Neisser, Andrew R. Neureuther, 2014 .

Studying Resist Stochastics with the Multivariate Poisson Propagation Model

Patrick P. Naulleau, Andrew R. Neureuther, Christopher N. Anderson, 2014 .

Multiplexed high resolution soft x-ray RIXS

Kenneth A. Goldberg, Markus P. Benk, Christopher N. Anderson, 2016 .

Don't always blame the photons: Relationships between deprotection blur, LER, and shot noise in EUV photoresists

P. Naulleau, C. Anderson, 2008 .

Pushing extreme ultraviolet lithography development beyond 22 nm half pitch

K. Goldberg, C. Koh, P. Naulleau, 2009 .

Extreme ultraviolet lithography: A few more pieces of the puzzle

C. Anderson, 2009 .

Do not always blame the photons: Relationships between deprotection blur, line-edge roughness, and shot noise in extreme ultraviolet photoresists

Patrick P. Naulleau, Christopher N. Anderson, P. Naulleau, 2009 .

Advanced development methods for high-NA EUV lithography

M. Somervell, K. Nafus, S. Nagahara, 2023, Advanced Lithography.

Reconstructing the three-dimensional latent image of extreme ultraviolet resists with resonant soft x-ray scattering

Cheng Wang, Alexander Hexemer, Guillaume Freychet, 2019, Journal of Micro/Nanolithography, MEMS, and MOEMS.

The trade-off between local critical dimension uniformity and sensitivity for contact hole high-NA printing in chemically amplified resists

Cheol-hong Park, Jinkyu Han, P. Naulleau, 2022, Photomask Technology.

Low-speckle holographic beam shaping of high-coherence EUV sources

Patrick P. Naulleau, Christopher N. Anderson, Ryan Miyakawa, 2011, Advanced Lithography.