Jianguang Chang

The influence of silicide technique on the device performance for deep sub-micro pMOSFETs

X. Ji, Y. Liao, Feng Yan, 2012, 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology.

The Leakage Current Improvement of a Ni-Silicided SiGe/Si Junction Using a Si Cap Layer and the PAI Technique

Rong Zhang, X. Ji, Feng Yan, 2012 .

Impact of various silicide techniques on SiGe source–drain series resistance and mobility of pMOSFETs

R. Zhang, X. Ji, Y. Liao, 2013 .