Jong Pyo Kim

Improvement of NBTI and electrical characteristics by ozone pre-treatment and PBTI issues in HfAlO(N) high-k gate dielectrics

Seong-Geon Park, C. Hwang, Jong-Ho Lee, 2003, IEEE International Electron Devices Meeting 2003.

Mass production worthy HfO/sub 2/-Al/sub 2/O/sub 3/ laminate capacitor technology using Hf liquid precursor for sub-100 nm DRAMs

Ho-Kyu Kang, Jong-Ho Lee, T. Seidel, 2002, Digest. International Electron Devices Meeting,.

Improved current performance of CMOSFETs with nitrogen incorporated HfO2-Al2O3 laminate gate dielectric

Ho-Kyu Kang, N. Lee, H. Chang, 2002, Digest. International Electron Devices Meeting,.