R. Stierstorfer

Stress Proximity Technique for Performance Improvement with Dual Stress Liner at 45nm Technology and Beyond

M. Belyansky, X. Chen, R. Amos, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

Anisotropic resistivity in off-c-axis grown Bi2Sr2CaCu2O8 films

D. Bäuerle, R. Roessler, T. Zahner, 1998 .

Off-diagonal Seebeck effect and anisotropic thermopower in Bi2Sr2CaCu2O8 thin films

D. Bäuerle, R. Schreiner, R. Roessler, 1997 .

Picosecond thermoelectric response of thin YBa2Cu3O7−δ films

A. Penzkofer, T. Schauer, T. Zahner, 1999 .

High Performance Transistors Featured in an Aggressively Scaled 45nm Bulk CMOS Technology

J. Sudijono, H. Utomo, M. Ieong, 2007, 2007 IEEE Symposium on VLSI Technology.