F. Chiu

发表

A Review on Conduction Mechanisms in Dielectric Films

F. Chiu, 2014 .

Structural and Electrical Characteristics of Alternative High‐k Dielectrics for CMOS Applications

T. Pan, F. Chiu, S. Mondal, 2012 .

ESD and Latchup Optimization of an Embedded-Floating-pMOS SCR-Incorporated BJT

C. Ou, F. Chiu, J. Tseng, 2016, IEEE Transactions on Electron Devices.

Effect of tantalum content on the structural properties and sensing performance of YbTaxOy electrolyte-insulator-semiconductor pH sensors

T. Pan, J. Her, Yu-Shu Huang, 2019, Journal of Alloys and Compounds.

Structural properties and electrical characteristics of high-k GdTiO3 gate dielectrics for InGaZnO thin-film transistors

T. Pan, Ching-Hung Chen, J. Her, 2014, 2014 Tenth International Vacuum Electron Sources Conference (IVESC).

Optimization of Photobiomodulation Dose in Biological Tissue by Adjusting the Focal Point of Lens

Chuan-Tsung Su, Jih-Huah Wu, Shih-Hsin Ma, 2022, Photonics.

Trap Exploration in Amorphous Boron-Doped ZnO Films

F. Chiu, Wen-Ping Chiang, 2015, Materials.

Lossy Mode Resonance-Based Glucose Sensor with High-κ Dielectric Film

Yu-Cheng Lin, Liang-Yu Chen, F. Chiu, 2019, Crystals.

Resistive Switching Characteristics in Boron Doped Zinc Oxide Films

F. Chiu, 2015 .

Voltage stress induced interface states and hole trapping in germanium pMOSFETs with high-k gate dielectric and metal-gate electrode

K. Chang-Liao, F. Chiu, Wei-Chia Chen, 2021 .

Interface characterization and current conduction in HfO2-gated MOS capacitors

H. W. Chen, H. Hwang, P. Juan, 2008 .

Current Conduction Mechanisms in CeO2 Thin Films

F. Chiu, 2008 .

Optical and electrical characterizations of cerium oxide thin films

Fu-Chien Chiu, Chih-Ming Lai, C. Lai, 2010 .

Leakage currents in amorphous Ta2O5 thin films

J. Lee, Shich-Chuan Wu, F. Chiu, 1997 .

Interfacial and Electrical Characterization in Metal–Oxide–Semiconductor Field-Effect Transistors with CeO2 Gate Dielectric

H. Hwang, Hung-Wen Chen, F. Chiu, 2009 .

Structural properties and electrical characteristics of high-k Dy2O3 gate dielectrics

T. Pan, F. Chiu, Wei-Tsung Chang, 2011 .

Metal–Oxide–High-$k$ -Oxide–Silicon Memory Device Using a Ti-Doped $\hbox{Dy}_{2}\hbox{O}_{3}$ Charge-Trapping Layer and $\hbox{Al}_{2}\hbox{O}_{3}$ Blocking Layer

Fa-Hsyang Chen, T. Pan, F. Chiu, 2011, IEEE Transactions on Electron Devices.

Metal-Oxide-High-k -Oxide-Silicon Memory Device Using a Ti-Doped {Dy}_{2}{O}_{3} Charge-Trapping Layer and {Al}_{2}{O}_{3} Blocking Layer

Fa-Hsyang Chen, T. Pan, F. Chiu, 2011 .

Electrical analyses of charge trapping and stress-induced leakage current in CeO2 gate dielectric

Shu-Hao Chang, F. Chiu, 2014 .

Electron conduction mechanism and band diagram of sputter-deposited Al∕ZrO2∕Si structure

Che-Wei Chang, Chih-Yao Huang, Fu-Chien Chiu, 2005 .

Conduction mechanism of resistive switching films in MgO memory devices

Fu-Chien Chiu, Wen-Chieh Shih, F. Chiu, 2012 .

National project on 45 to 32 nm metal oxide semiconductor field effect transistors for next century IC fabrications

H. Hwang, K. Leou, Kow-Ming Chang, 2008, 2008 IEEE International Conference on Electron Devices and Solid-State Circuits.

Electrical characterization of CeO2∕Si interface properties of metal-oxide-semiconductor field-effect transistors with CeO2 gate dielectric

J. Lee, F. Chiu, I. Chang, 2008 .

Polarity of Bipolar Resistive Switching Characteristics in ZnO Memory Films

Y. Chueh, F. Chiu, Ching-Shiang Peng, 2011 .

Electrical conduction mechanisms of metal∕La2O3∕Si structure

Fu-Chien Chiu, J. Lee, F. Chiu, 2005 .

Conduction Mechanisms in Resistance Switching Memory Devices Using Transparent Boron Doped Zinc Oxide Films

F. Chiu, 2014, Materials.

Interface characterization and carrier transportation in metal/HfO2/silicon structure

Fu-Chien Chiu, F. Chiu, 2006 .

Surface State Capture Cross-Section at the Interface between Silicon and Hafnium Oxide

F. Chiu, 2013 .

Reliability characteristics and conduction mechanisms in resistive switching memory devices using ZnO thin films

F. Chiu, W. Chang, Peng-Wei Li, 2012, Nanoscale Research Letters.

Electrical characterization and carrier transportation in Hf-silicate dielectrics using ALD gate stacks for 90 nm node MOSFETs

Fu-Chien Chiu, H. W. Chen, Chuan-Hsi Liu, 2008 .

The charge trapping effect of metal-ferroelectric (PbZr0.53Ti0.47O3)-insulator (HfO2)-silicon capacitors

P. Juan, J. Lee, F. Chiu, 2005 .

Thin Film Applications in Advanced Electron Devices

T. Pan, C. Shih, F. Chiu, 2014 .

An investigation of surface state capture cross-sections for metal-oxide-semiconductor field-effect transistors using HfO2 gate dielectrics

Fu-Chien Chiu, Huey-Liang Hwang, Wen-Chieh Shih, 2007, Microelectron. Reliab..

Negative resistance characterisation and defective trap exploration in ZnO nonvolatile memory devices

T. Pan, F. Chiu, Chih-Yao Huang, 2014 .

Electrical characterization and current transportation in metal∕Dy2O3∕Si structure

F. Chiu, 2007 .

Current conduction mechanisms in Pr2O3/oxynitride laminated gate dielectrics

Fu-Chien Chiu, Tung-Ming Pan, T. Pan, 2009 .

Inserted substrate pickup style with external resistance in an ESD NMOS transistor

Chih-Yao Huang, Fu-Chien Chiu, Bo-Chen Lin, 2017, 2017 IEEE 24th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA).

A Split Island Layout Style of Butting/Inserted Substrate Pickups for NMOSFET ESD Reliability

F. Chiu, Chih-Yao Huang, Bo-Chen Lin, 2015 .

A Substrate-and-Gate Triggering NMOS Device for High ESD Reliability in Deep Submicrometer Technology

F. Chiu, Chih-Yao Huang, 2013 .

Effect of titanium content on the impedance characteristics of high-Κ TbTxOy electrolyte-insulator-semiconductor pH sensors

T. Pan, L. Chi, F. Chiu, 2014, 2014 Tenth International Vacuum Electron Sources Conference (IVESC).

Electrical properties of metal-HfO2-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO2 gate dielectric

Fu-Chien Chiu, Joseph Ya-min Lee, Shun-An Lin, 2005, Microelectron. Reliab..

Analysis of breakdown characteristics in high-k dielectrics under electrostatic discharge impulse stress

H. Hwang, M. Liao, F. Chiu, 2010 .