J. Ferguson

发表

Mud removal and cement placement during primary cementing of an oil well – Laminar non-Newtonian displacements in an eccentric annular Hele-Shaw cell

I. Frigaard, S. Bittleston, J. Ferguson, 2002 .

Measurements of surface diffusivity and coarsening during pulsed laser deposition.

J. D. Brock, A. Woll, D. Dale, 2009, Physical review letters.

Atomic Layer Deposition of SiO2 Films on BN Particles Using Sequential Surface Reactions

S. George, J. Ferguson, and A. W. Weimer, 2000 .

Real time monitoring of pentacene growth on SiO2 from a supersonic source

J. D. Brock, G. Malliaras, James R Engstrom, 2008 .

Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions

S. George, A. Weimer, J. Ferguson, 2000 .

SOLID-PROPELLANT ROCKET IGNITION RESEARCH.

J. D. Ferguson, W. C. Ragsdale, C. F. Sharn, 1964 .

Post-deposition reorganization of pentacene films deposited on low-energy surfaces

Vladimir A. Pozdin, G. Malliaras, James R Engstrom, 2009 .

SnO2 atomic layer deposition on ZrO2 and Al nanoparticles: Pathway to enhanced thermite materials

S. George, A. Weimer, J. Ferguson, 2005 .

Atomic layer deposition of boron nitride using sequential exposures of BCl3 and NH3

S. George, A. Weimer, J. Ferguson, 2002 .

Atomic layer deposition of ultrathin and conformal Al2O3 films on BN particles

Alan W. Weimer, Steven M. George, J. D. Ferguson, 2000 .

Atomic Layer Deposition of thin Films Using Sequential Surface Reactions

S. George, J. Klaus, J. Ferguson, 2000 .

ALD of SiO2 at Room Temperature Using TEOS and H 2 O with NH 3 as the Catalyst

E. R. Smith, S. George, A. Weimer, 2004 .

Surface chemistry and film growth during TiN atomic layer deposition using TDMAT and NH3

Steven M. George, Jeffrey W. Elam, J. D. Ferguson, 2003 .

Unimolecular rate constants for HX or DX elimination (X = F, Cl) from chemically activated CF3CH2CH2Cl, C2H5CH2Cl, and C2D5CH2Cl: threshold energies for HF and HCl elimination.

P. Kekenes-Huskey, J. Ferguson, B. E. Holmes, 2005, Journal of Physical Chemistry A.

Threshold Energies and Unimolecular Rate Constants for Elimination of HF from Chemically Activated CF3CH2CH3and CF3CH2CF3: Effect of CH3and CF3Substituents at the β-Carbon and Implications about the Transition State

J. Ferguson, B. E. Holmes, H. A. Ferguson, 1998 .

Nucleation, coarsening, and coalescence during layer-by-layer growth of complex oxides via pulsed laser deposition: Time-resolved, diffuse X-ray scattering studies

Yongsam Kim, A. Woll, J. Ferguson, 2010 .

Final Report: Optical Properties of ZBLAN Microspheres Produced in Microgravity

D. Englund, Nathan Wozny, D. Stick, 2002 .

Atomic layer deposition of boron nitride using sequential exposures of BCl and NH 3 3

S. George, A. Weimer, J. Ferguson, 2002 .

Surface chemistry and film growth during TiN atomic layer deposition 4 using TDMAT and NH 3

J. W. Elam, J. D. Ferguson, M. Schuisky, 2022 .

Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles

S. George, A. Weimer, J. Ferguson, 2005 .

Time Resolved In-Situ Diffuse X-ray Scattering Measurements of the Surface Morphology of Homoepitaxial SrTiO3 Films During Pulsed Laser Deposition

A. Amassian, M. Tate, A. Woll, 2007 .

TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O

Alan W. Weimer, Steven M. George, J. D. Ferguson, 2004 .

Atomic Layer Deposition of Al 2 O 3 Films on Polyethylene Particles

Steven M. George, J. D. Ferguson, S. George, 2004 .

Vehicle growth trends in Singapore

J. Ferguson, S. Cochrane, M. A. Al-Mufti, 1986 .

RESULTS OF IGNITABILITY TEST FOR JANAF AD HOC IGNITABILITY PANEL USING THE LOCKED-STROKE COMPRESSOR

John D. Ferguson, J. Ferguson, 1960 .